从方位磁场角度看雷电 M 分量经典导波模型与修正导波模型的比较

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Quanxin Li;Guohua Yang;Jinliang He
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引用次数: 0

摘要

本文介绍了不同距离范围内闪电 M 分量的方位磁场。文章考虑了两种导波模型,即经典的导波 M 分量模型和修正的导波 M 分量模型,后者包含了沿通道的指数电流衰减。分析中使用了快速和慢速 M 分量电流波形。研究考察了两种模型在近、中、远距离范围内的磁场差异。研究发现,经典导波 M 分量模型(CGM)和修正导波 M 分量模型(MGM)预测的磁场在近距离时差异相对较小。然而,在中距离和远距离时,这些差异变得更加明显。据观察,与慢速 M 分量相比,快速 M 分量的振幅差异更为明显。研究还包括对辐射磁场的敏感性分析,这可能是为了探索影响闪电 M 分量磁场大小的因素。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
On the Comparison of Lightning M-Component Classical and Modified Guided-Wave Models From the Aspects of Azimuthal Magnetic Fields
The azimuthal magnetic fields of lightning M-components at various distance ranges were presented in this article. Two guided-wave models, namely, the classical guided-wave M-component model and the modified guided-wave M-component model, incorporating exponential current decay along the channel, were considered. Both fast and slow M-component current waveforms were utilized in the analysis. The study examined the magnetic field differences between the two models at close, intermediate, and far distance ranges. It was found that the discrepancies between the magnetic fields predicted by the classical guided-wave M-component model (CGM) and modified guided-wave M-component model (MGM) were relatively small at close distances. However, these differences became more noticeable at intermediate and far distances. It was observed that the amplitude differences were more prominent for the fast M-component compared with that of the slow M-component. The study also included a sensitivity analysis on the radiated magnetic fields, which likely explored the factors influencing the magnitude of the lightning M-component magnetic fields.
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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