用于高温运行的氮化铝/氮化镓高电子迁移率晶体管放大器

IF 2 3区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Pingyu Cao;Kepeng Zhao;Harm Van Zalinge;Ping Zhang;Miao Cui;Fei Xue
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引用次数: 0

摘要

本文介绍了一种基于氮化镓/氮化镓金属绝缘体-半导体高电子迁移率晶体管(MIS-HEMT)的高增益电压放大器,该放大器具有单片集成的增强型(E 模)和耗尽型(D 模)器件。GaN 放大器由基于 E 模式器件的差分对、基于 D 模式器件的有源负载和电流源组成,并评估了电流源对电压增益的影响。所提出的放大器在室温(25 °C)和高温(250 °C)条件下均表现出较高的增益和较高的单位增益频率。室温下的增益为 37.4 dB,当温度升至 250 °C 时,增益略降至 32.7 dB。此外,通过减小静态电流,本作品中报告的功耗降低到 60 mW,芯片面积减小到 2.806{\times 10^{5}\mu {\mathrm { m^{2}}}}$ 。这些结果表明,所提出的放大器适用于小信号传感或驱动电路,有望为高温工作的硅基氮化镓集成电路带来高功率密度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
AlGaN/GaN High Electron Mobility Transistor Amplifier for High-Temperature Operation
This paper presents a high gain voltage amplifier based on AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistors (MIS-HEMTs) with monolithically integrated enhancement-mode (E-mode) and depletion-mode (D-mode) devices. The GaN amplifier consists of differential pair based on E-mode devices, active loads based on D-mode devices and a current source, and the influence of the current source on voltage gain was evaluated. The proposed amplifier demonstrates a high gain and high unity-gain frequency at both room temperature (25 °C) and high-temperature (250 °C). The gain is 37.4 dB at room temperature, slightly decreasing to 32.7 dB when the temperature rises to 250 °C. Moreover, the power consumption reported in this work is decreased to 60 mW by reducing the static current, and the chip area of this work is reduced to $2.806{\times 10^{5}\mu {\mathrm { m^{2}}}}$ . These results indicate that the proposed amplifier is suitable for small signal sensing or driving circuits, which would promise high power density for GaN-on-Si integration circuits with high-temperature operation.
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来源期刊
IEEE Journal of the Electron Devices Society
IEEE Journal of the Electron Devices Society Biochemistry, Genetics and Molecular Biology-Biotechnology
CiteScore
5.20
自引率
4.30%
发文量
124
审稿时长
9 weeks
期刊介绍: The IEEE Journal of the Electron Devices Society (J-EDS) is an open-access, fully electronic scientific journal publishing papers ranging from fundamental to applied research that are scientifically rigorous and relevant to electron devices. The J-EDS publishes original and significant contributions relating to the theory, modelling, design, performance, and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanodevices, optoelectronics, photovoltaics, power IC''s, and micro-sensors. Tutorial and review papers on these subjects are, also, published. And, occasionally special issues with a collection of papers on particular areas in more depth and breadth are, also, published. J-EDS publishes all papers that are judged to be technically valid and original.
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