Zhang Yimiao , Qiu Mingbo , Li Hui , Wang Yingmin , Li Jingtao , Liu Zhaowei , Di Yifan , Cheng Hongjuan
{"title":"利用液态浸入式线切割放电加工技术加工氧化镓晶体","authors":"Zhang Yimiao , Qiu Mingbo , Li Hui , Wang Yingmin , Li Jingtao , Liu Zhaowei , Di Yifan , Cheng Hongjuan","doi":"10.1016/j.mssp.2024.109049","DOIUrl":null,"url":null,"abstract":"<div><div>To address the issues of cracking and cleavage commonly encountered during conventional mechanical processing of gallium oxide (<span><math><mrow><msub><mtext>Ga</mtext><mn>2</mn></msub><msub><mi>O</mi><mn>3</mn></msub></mrow></math></span>) crystals using several methods, such as outer circle cutting and diamond wire sawing, this study proposed a liquid-immersion wire-cut electrical discharge machining (WEDM) technique. This study also revealed that the segregation phenomena during the growth of <span><math><mrow><msub><mtext>Ga</mtext><mn>2</mn></msub><msub><mi>O</mi><mn>3</mn></msub></mrow></math></span> crystals resulted in non-uniform resistivity within the crystal, leading to the failure of traditional spray-type electro-discharge wire-cutting techniques. To overcome this limitation, the feasibility of the liquid-immersion WEDM technique was proposed, and an experimental platform was established. Resistivity measurements of the cut surfaces of <span><math><mrow><msub><mtext>Ga</mtext><mn>2</mn></msub><msub><mi>O</mi><mn>3</mn></msub></mrow></math></span> in kerosene immersion revealed a reduction of approximately 99.2 % in the resistivity difference. This result shows that the formation of carbon films during processing can effectively compensate for the intrinsic non-uniform resistivity. An equivalent circuit model for liquid-immersion WEDM of <span><math><mrow><msub><mtext>Ga</mtext><mn>2</mn></msub><msub><mi>O</mi><mn>3</mn></msub></mrow></math></span> crystals in kerosene was developed. Thermodynamic and kinetic analyses were conducted on hydrocarbon decomposition reactions in kerosene at discharge temperatures. The results confirmed that decomposition reactions could occur during the discharge process. A truncation experiment for <span><math><mrow><msub><mtext>Ga</mtext><mn>2</mn></msub><msub><mi>O</mi><mn>3</mn></msub></mrow></math></span> ingots was conducted, and a method using single-crystal silicon for electrical assistance in the processing of 1-inch wafers was proposed. The experimental results showed that liquid-immersion WEDM of <span><math><mrow><msub><mtext>Ga</mtext><mn>2</mn></msub><msub><mi>O</mi><mn>3</mn></msub></mrow></math></span> crystals in kerosene effectively suppressed cracking and cleavage, achieving a processing accuracy within 50 μm and successfully producing a 1-inch circular <span><math><mrow><msub><mtext>Ga</mtext><mn>2</mn></msub><msub><mi>O</mi><mn>3</mn></msub></mrow></math></span> wafer, with the machining accuracy improved by approximately 66.6 % compared to diamond wire cutting.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"186 ","pages":"Article 109049"},"PeriodicalIF":4.2000,"publicationDate":"2024-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Processing of gallium oxide crystals using liquid-immersion wire-cut electrical discharge machining\",\"authors\":\"Zhang Yimiao , Qiu Mingbo , Li Hui , Wang Yingmin , Li Jingtao , Liu Zhaowei , Di Yifan , Cheng Hongjuan\",\"doi\":\"10.1016/j.mssp.2024.109049\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>To address the issues of cracking and cleavage commonly encountered during conventional mechanical processing of gallium oxide (<span><math><mrow><msub><mtext>Ga</mtext><mn>2</mn></msub><msub><mi>O</mi><mn>3</mn></msub></mrow></math></span>) crystals using several methods, such as outer circle cutting and diamond wire sawing, this study proposed a liquid-immersion wire-cut electrical discharge machining (WEDM) technique. This study also revealed that the segregation phenomena during the growth of <span><math><mrow><msub><mtext>Ga</mtext><mn>2</mn></msub><msub><mi>O</mi><mn>3</mn></msub></mrow></math></span> crystals resulted in non-uniform resistivity within the crystal, leading to the failure of traditional spray-type electro-discharge wire-cutting techniques. To overcome this limitation, the feasibility of the liquid-immersion WEDM technique was proposed, and an experimental platform was established. Resistivity measurements of the cut surfaces of <span><math><mrow><msub><mtext>Ga</mtext><mn>2</mn></msub><msub><mi>O</mi><mn>3</mn></msub></mrow></math></span> in kerosene immersion revealed a reduction of approximately 99.2 % in the resistivity difference. This result shows that the formation of carbon films during processing can effectively compensate for the intrinsic non-uniform resistivity. An equivalent circuit model for liquid-immersion WEDM of <span><math><mrow><msub><mtext>Ga</mtext><mn>2</mn></msub><msub><mi>O</mi><mn>3</mn></msub></mrow></math></span> crystals in kerosene was developed. Thermodynamic and kinetic analyses were conducted on hydrocarbon decomposition reactions in kerosene at discharge temperatures. The results confirmed that decomposition reactions could occur during the discharge process. A truncation experiment for <span><math><mrow><msub><mtext>Ga</mtext><mn>2</mn></msub><msub><mi>O</mi><mn>3</mn></msub></mrow></math></span> ingots was conducted, and a method using single-crystal silicon for electrical assistance in the processing of 1-inch wafers was proposed. The experimental results showed that liquid-immersion WEDM of <span><math><mrow><msub><mtext>Ga</mtext><mn>2</mn></msub><msub><mi>O</mi><mn>3</mn></msub></mrow></math></span> crystals in kerosene effectively suppressed cracking and cleavage, achieving a processing accuracy within 50 μm and successfully producing a 1-inch circular <span><math><mrow><msub><mtext>Ga</mtext><mn>2</mn></msub><msub><mi>O</mi><mn>3</mn></msub></mrow></math></span> wafer, with the machining accuracy improved by approximately 66.6 % compared to diamond wire cutting.</div></div>\",\"PeriodicalId\":18240,\"journal\":{\"name\":\"Materials Science in Semiconductor Processing\",\"volume\":\"186 \",\"pages\":\"Article 109049\"},\"PeriodicalIF\":4.2000,\"publicationDate\":\"2024-10-31\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Materials Science in Semiconductor Processing\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1369800124009454\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science in Semiconductor Processing","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369800124009454","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Processing of gallium oxide crystals using liquid-immersion wire-cut electrical discharge machining
To address the issues of cracking and cleavage commonly encountered during conventional mechanical processing of gallium oxide () crystals using several methods, such as outer circle cutting and diamond wire sawing, this study proposed a liquid-immersion wire-cut electrical discharge machining (WEDM) technique. This study also revealed that the segregation phenomena during the growth of crystals resulted in non-uniform resistivity within the crystal, leading to the failure of traditional spray-type electro-discharge wire-cutting techniques. To overcome this limitation, the feasibility of the liquid-immersion WEDM technique was proposed, and an experimental platform was established. Resistivity measurements of the cut surfaces of in kerosene immersion revealed a reduction of approximately 99.2 % in the resistivity difference. This result shows that the formation of carbon films during processing can effectively compensate for the intrinsic non-uniform resistivity. An equivalent circuit model for liquid-immersion WEDM of crystals in kerosene was developed. Thermodynamic and kinetic analyses were conducted on hydrocarbon decomposition reactions in kerosene at discharge temperatures. The results confirmed that decomposition reactions could occur during the discharge process. A truncation experiment for ingots was conducted, and a method using single-crystal silicon for electrical assistance in the processing of 1-inch wafers was proposed. The experimental results showed that liquid-immersion WEDM of crystals in kerosene effectively suppressed cracking and cleavage, achieving a processing accuracy within 50 μm and successfully producing a 1-inch circular wafer, with the machining accuracy improved by approximately 66.6 % compared to diamond wire cutting.
期刊介绍:
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.
Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.
Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.