一种由碳化锆提供的气相碱卤化物辅助稳定前驱体用于合成二维大尺寸 ZrS2 纳米片†。

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Xuehao Guo, Xiulian Fan, Xilong Zhou, Wenlong Chu, Chenyang Niu, Liqi He, Shizhen Bin and Yu Zhou
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引用次数: 0

摘要

HfS2 和 ZrS2 等 IVB 族过渡金属二钙化物具有适中的带隙和较高的载流子迁移率,具有最有前途的半导体特性。然而,大域尺寸单晶 ZrS2 纳米片的横向生长仍有待开发,这限制了各种电子和光电应用。在此,我们报告了一种用于合成具有横向取向的大尺寸二维 ZrS2 纳米片的新前驱体策略。高熔点碳化锆作为一种稳定的前驱体,其挥发是通过远程气相碱卤化物的辅助来控制的,从而避免了初始阶段的高成核密度和垂直取向。通过调节生长参数,二维 ZrS2 纳米片的横向尺寸可达 22 μm,厚度为 8 nm,并表现出良好的结晶品质和均匀的表面。二维 ZrS2 纳米片的场效应晶体管表现出 n 型传输特性,具有较高的导通/关断比和合理的载流子迁移率。我们的新前驱体和化学设计为合成高性能的 IVB 族过渡金属二卤化物晶片铺平了道路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

A gas-phase alkali-halide-assisted stable precursor supplied from zirconium carbide for the synthesis of 2D large-sized ZrS2 nanosheets†

A gas-phase alkali-halide-assisted stable precursor supplied from zirconium carbide for the synthesis of 2D large-sized ZrS2 nanosheets†

Group-IVB transition metal dichalcogenides such as HfS2 and ZrS2 demonstrate the most promising semiconducting properties, with moderate band gaps and high predicted carrier mobilities. However, the lateral growth of large-domain-size single crystalline ZrS2 nanosheets remains to be developed, which limits various electronic and optoelectronic applications. Here, we report a new precursor strategy for the synthesis of large-sized 2D ZrS2 nanosheets with lateral orientations. Volatilization of high-melting-point zirconium carbide as a stable precursor was controlled through the assistance of a remote gas-phase alkali halide, which avoids high nucleation density and vertical orientation at the initial stage. The 2D ZrS2 nanosheets were regulated by adjusting the growth parameters to give a lateral size of up to 22 μm and a thickness of 8 nm, and exhibited good crystalline qualities and a uniform surface. Field effect transistors of 2D ZrS2 nanosheets exhibited n-type transport characteristics with a high on/off ratio and reasonable carrier mobilities. Our new precursor and chemical design pave the way for the synthesis of high-performance group-IVB transition metal dichalcogenide wafers.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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