用于高灵敏度光检测的硅锗/硅异质结光电晶体管

IF 2.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Hongyun Xie;Xiaoting Shen;Yunpeng Ge;Zimai Xu;Ziming Liu;Yudong Ma;Weicong Na;Dongyue Jin;Wanrong Zhang
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引用次数: 0

摘要

硅基异质结光电晶体管(HPT)具有高内部增益、高响应度以及与 CMOS 工艺兼容等优点,在高灵敏度光探测领域备受关注。本文设计并制作了发光面积为 50~50/times 50~\mu $ m2 的 SiGe/Si HPT,实现了高响应率和高灵敏度。所制备的硅锗/硅 HPT 在 405 和 650 nm 波长下的光响应率分别达到了 1.717 和 12.379 A/W,比检测率分别为 1.54 倍 10^{{10}}$ 和 11.16 倍 10^{{10}}~text {cm}\cdot \text {Hz}^{{0.5}}\cdot \text {W}^{-{1}}$ 。在考虑吸收效率和载流子传输时,建立了一个分析模型来讨论不同波长的电流放大。发射极厚度优化为 60 nm,从而显著提高了短波长下的电流放大率。优化后的 SiGe/Si HPT 在 405 和 650 nm 波长下的光响应率分别为 13.756 和 13.904 A/W,比检测率分别为 $12.41/times 10^{{10}}$ 和 $12.54/times 10^{{10}}~\text {cm}\cdot \text {Hz}^{{0.5}}.\cdot \text {W}^{-{1}}$ .
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A SiGe/Si Heterojunction Phototransistor for High Sensitivity Light Detection
Silicon-based heterojunction phototransistors (HPTs) with their advantages of high internal gain, high responsivity, and compatibility with CMOS processes have attracted much attention in high-sensitivity light detection. In this article, the SiGe/Si HPT with an illuminated area of $50\times 50~\mu $ m2 for high responsivity and sensitivity was designed and fabricated. The optical responsivity of the fabricated SiGe/Si HPT reached 1.717 and 12.379 A/W for 405 and 650 nm, their specific detectivity values were $1.54\times 10^{{10}}$ and $11.16\times 10^{{10}}~\text {cm}\cdot \text {Hz}^{{0.5}}\cdot \text {W}^{-{1}}$ , respectively. An analytic model was developed to discuss current amplification for different wavelengths when considering absorption efficiency and carrier transportation. The emitter thickness was optimized as 60 nm to significantly improve the current amplification under short wavelengths. The achieved optical responsivity of the optimized SiGe/Si HPT for 405 and 650 nm respectively were 13.756 and 13.904 A/W, and the specific detectivity were $12.41\times 10^{{10}}$ and $12.54\times 10^{{10}}~\text {cm}\cdot \text {Hz}^{{0.5}} \cdot \text {W}^{-{1}}$ .
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来源期刊
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices 工程技术-工程:电子与电气
CiteScore
5.80
自引率
16.10%
发文量
937
审稿时长
3.8 months
期刊介绍: IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
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