{"title":"超宽带隙 Al₀.₆₄Ga₀.₃₆N 沟道 HEMT 中有效本征电子速度 >107 厘米/秒的证明","authors":"Parthasarathy Seshadri;Jiahao Chen;Kenneth Stephenson;Md Abdullah Mamun;Ruixin Bai;Zehuan Wang;Shubhra Pasayat;Asif Khan;Chirag Gupta","doi":"10.1109/TED.2024.3464584","DOIUrl":null,"url":null,"abstract":"This article reports on the effective intrinsic electron velocity exceeding \n<inline-formula> <tex-math>$10^{{7}}$ </tex-math></inline-formula>\n cm/s in high-composition Al\n<inline-formula> <tex-math>$_{{0.64}}\\text {Ga}_{{0.36}}$ </tex-math></inline-formula>\nN channel high-electron-mobility transistors (HEMTs) at peak \n<inline-formula> <tex-math>${f}_{t}$ </tex-math></inline-formula>\n. The small-signal two-port s-parameter measurements were employed at peak \n<inline-formula> <tex-math>${f}_{t}$ </tex-math></inline-formula>\n bias, which enabled us to compute the small-signal parameters and determine the total transit delay. A device with ~245-nm gate length yielded a total transit delay of 8.04 ps corresponding to a peak \n<inline-formula> <tex-math>${f}_{t}$ </tex-math></inline-formula>\n of 19.8 GHz. By segregating the delay components, the intrinsic delay was estimated to be 6.22 ps. However, this intrinsic delay includes the effect of fringe capacitances that were further decoupled to yield the intrinsic transit time. The transit time under the gate was estimated to be 2.12 ps, and thus, the peak effective intrinsic electron velocity was determined to be \n<inline-formula> <tex-math>$1.15\\times 10^{{7}}$ </tex-math></inline-formula>\n cm/s. These findings offer crucial insights for optimizing the design and performance of high-composition AlGaN channel HEMTs at RF power frequencies.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"71 11","pages":"6604-6608"},"PeriodicalIF":2.9000,"publicationDate":"2024-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Demonstration of Effective Intrinsic Electron Velocity >107 cm/s in Ultrawide Bandgap Al₀.₆₄Ga₀.₃₆N Channel HEMTs\",\"authors\":\"Parthasarathy Seshadri;Jiahao Chen;Kenneth Stephenson;Md Abdullah Mamun;Ruixin Bai;Zehuan Wang;Shubhra Pasayat;Asif Khan;Chirag Gupta\",\"doi\":\"10.1109/TED.2024.3464584\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This article reports on the effective intrinsic electron velocity exceeding \\n<inline-formula> <tex-math>$10^{{7}}$ </tex-math></inline-formula>\\n cm/s in high-composition Al\\n<inline-formula> <tex-math>$_{{0.64}}\\\\text {Ga}_{{0.36}}$ </tex-math></inline-formula>\\nN channel high-electron-mobility transistors (HEMTs) at peak \\n<inline-formula> <tex-math>${f}_{t}$ </tex-math></inline-formula>\\n. The small-signal two-port s-parameter measurements were employed at peak \\n<inline-formula> <tex-math>${f}_{t}$ </tex-math></inline-formula>\\n bias, which enabled us to compute the small-signal parameters and determine the total transit delay. A device with ~245-nm gate length yielded a total transit delay of 8.04 ps corresponding to a peak \\n<inline-formula> <tex-math>${f}_{t}$ </tex-math></inline-formula>\\n of 19.8 GHz. By segregating the delay components, the intrinsic delay was estimated to be 6.22 ps. However, this intrinsic delay includes the effect of fringe capacitances that were further decoupled to yield the intrinsic transit time. The transit time under the gate was estimated to be 2.12 ps, and thus, the peak effective intrinsic electron velocity was determined to be \\n<inline-formula> <tex-math>$1.15\\\\times 10^{{7}}$ </tex-math></inline-formula>\\n cm/s. These findings offer crucial insights for optimizing the design and performance of high-composition AlGaN channel HEMTs at RF power frequencies.\",\"PeriodicalId\":13092,\"journal\":{\"name\":\"IEEE Transactions on Electron Devices\",\"volume\":\"71 11\",\"pages\":\"6604-6608\"},\"PeriodicalIF\":2.9000,\"publicationDate\":\"2024-10-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Transactions on Electron Devices\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10702604/\",\"RegionNum\":2,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10702604/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Demonstration of Effective Intrinsic Electron Velocity >107 cm/s in Ultrawide Bandgap Al₀.₆₄Ga₀.₃₆N Channel HEMTs
This article reports on the effective intrinsic electron velocity exceeding
$10^{{7}}$
cm/s in high-composition Al
$_{{0.64}}\text {Ga}_{{0.36}}$
N channel high-electron-mobility transistors (HEMTs) at peak
${f}_{t}$
. The small-signal two-port s-parameter measurements were employed at peak
${f}_{t}$
bias, which enabled us to compute the small-signal parameters and determine the total transit delay. A device with ~245-nm gate length yielded a total transit delay of 8.04 ps corresponding to a peak
${f}_{t}$
of 19.8 GHz. By segregating the delay components, the intrinsic delay was estimated to be 6.22 ps. However, this intrinsic delay includes the effect of fringe capacitances that were further decoupled to yield the intrinsic transit time. The transit time under the gate was estimated to be 2.12 ps, and thus, the peak effective intrinsic electron velocity was determined to be
$1.15\times 10^{{7}}$
cm/s. These findings offer crucial insights for optimizing the design and performance of high-composition AlGaN channel HEMTs at RF power frequencies.
期刊介绍:
IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.