原子分辨率二次电子成像的表面灵敏度。

Koh Saitoh, Teppei Oyobe, Keisuke Igarashi, Takeshi Sato, Hiroaki Matsumoto, Hiromi Inada, Takahiko Endo, Yasumitsu Miyata, Rei Usami, Taishi Takenobu
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引用次数: 0

摘要

利用以 30 度角堆叠的扭曲双层 MoS2,研究了高分辨率二次电子(SE)成像的表面灵敏度。扭曲双层 MoS2 的高分辨率 SE 图像显示了由 Mo 原子和 S 原子组成的蜂巢结构,从而阐明了 MoS2 的单层结构。从同一区域同时拍摄的环形暗场扫描透射电子显微镜图像显示了两层的投影结构。也就是说,双层 MoS2 的 SE 图像可选择性地观察到表面单层。值得注意的是,来自表面单层的 SE 产率大约是来自第二单层的 SE 产率的 3 倍,这可能是由于从第二层发射的 SE 穿过表面层时产生了衰减。小摘要:本研究利用由表层和基底组成的最薄系统--MoS2 双层膜,对原子分辨率二次电子成像的表面灵敏度进行了研究。研究发现,二次电子对表面单层原子排列的观察强度是第二层的三倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Surface sensitivity of atomic resolution secondary electron imaging.

The surface sensitivity of high-resolution secondary electron (SE) imaging is examined using twisted bilayers of MoS2 stacked at an angle of 30-degree. High-resolution SE images of the twisted bilayer MoS2 show a honeycomb structure composed of Mo and S atoms, elucidating the monolayer structure of MoS2. Simultaneously captured annular dark-field scanning transmission electron microscope images from the same region show the projected structure of the two layers. That is, the SE images from the bilayer MoS2 selectively visualize the surface monolayer. It is noted that SE yields from the surface monolayer are approximately 3 times higher than those from the second monolayer, likely attributable to attenuation when SEs emitted from the second layer traverse the surface layer. Mini abstract: The surface sensitivity of atomic resolution secondary electron imaging is examined using MoS2 bilayers, the thinnest system composed of a surface layer and substrate. This study reveals that the secondary electrons visualize the atomic arrangement of the surface monolayer three times more intensely than that of the second layer.

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