基于形态、结构和表面诱导响应的交错电极接触上二氧化钛纳米粒子层的安培稳定性研究

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Mohamad Nizar Hadi Mohamad Nassir , Sh. Nadzirah , Azrul Azlan Hamzah , Ahmad Ghadafi Ismail , Hung Wei Yu , Edward Yi Chang , Chang Fu Dee
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引用次数: 0

摘要

本文研究了插接电极(IDE)上二氧化钛(TiO2)纳米粒子层的安培稳定性,以开发稳定的电子器件。为了获得结晶度较高的二氧化钛纳米粒子层,对器件进行了不同旋涂层数量和退火温度的测试。器件的制作包括用 IDE 光掩膜在二氧化硅(SiO2)晶片上涂覆 TiO2 溶液。使用场发射扫描电子显微镜(FESEM)和 X 射线衍射仪(XRD)对器件进行了表征,以验证二氧化钛的结晶度。此外,还通过电流-电压(I-V)曲线和实时电流测量来分析器件的电气特性。FESEM 结果表明,增加旋涂层数和退火温度可提高 TiO2 纳米粒子球形形状的清晰度,并产生高结晶度的纳米粒子,这一点已得到 XRD 分析的证实。在电学分析方面,该器件的电流急剧增加,保持在 2.5 nA 至 10 nA 的范围内。由此得出结论,TiO2 器件灵敏度高,具有出色的重复性和响应时间,适合实际应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
An amperometric stability study of titanium dioxide nanoparticle layer on interdigitated electrode contact based on morphology, structure, and surface-induced response

This paper investigates the amperometric stability of a Titanium Dioxide (TiO2) nanoparticle layer on an interdigitated electrode (IDE) to develop stable electronic devices. The devices were tested with varying numbers of spin-coat layers and annealing temperatures to achieve a TiO2 nanoparticle layer with high crystallinity. Device fabrication involved coating a TiO2 solution onto a silicon dioxide (SiO2) wafer with an IDE photomask. The devices were characterized using a Field-emission Scanning Electron Microscope (FESEM) and X-ray Diffractometer (XRD) to verify the crystallinity of the TiO2. Current-voltage (I-V) curves and real-time current measurements were also conducted to analyze the electrical properties of the device. FESEM results indicate that increasing the number of spin-coat layers and annealing temperature enhances the clarity of the spherical shape of TiO2 nanoparticles and produces highly crystalline nanoparticles, as confirmed by XRD analysis. In terms of electrical analysis, the device exhibited a sharp increase in current, maintaining a range of 2.5 nA to 10 nA. This concludes that the TiO2 device is highly sensitive, with excellent repeatability and response time, making it suitable for practical applications.

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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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