{"title":"用于电子束增材制造设备的可调四极管电子枪的静电设计","authors":"Zhenyi Zhang;Zijian Zhou;Keyan Sheng;Haozhe Li;Mianzhi Xiong;Jiangrui Xing;Chunjiang Lin;Jiang Huang","doi":"10.1109/TPS.2024.3449088","DOIUrl":null,"url":null,"abstract":"The electron gun, as a critical device for emitting high-speed electrons, determines the electron beam current and quality in electron beam additive manufacturing (EBAM). In this article, a tetrode electron gun with a control electrode is designed to improve the quality and controllability of the electron beam. The control electrode, optimized by parametric simulation, provides secondary confinement of the electron beam. This confinement aims to reduce the beam spot size and emittance while decoupling spot size from the current. Specifically, the maximum attainable current reaches 200 mA, while the beam waist radius contracts to a mere 1.09 mm. The normalized emittance, a crucial parameter, measures at \n<inline-formula> <tex-math>$1.536\\times 10^{-{7}}~\\text {m}\\cdot \\text {rad}$ </tex-math></inline-formula>\n. Furthermore, stability analysis of the electron gun explores the influence of electrode potential on its performance. By co-regulating the bias voltage and the control voltage, the electron beam current can smoothly rise to 200 mA while maintaining the beam spot radius of 2 mm. This article indicates the tetrode electron gun’s potential for precise control, thereby improving the quality and precision of high melting point alloy additive manufacturing processes.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 7","pages":"2760-2765"},"PeriodicalIF":1.3000,"publicationDate":"2024-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Electrostatic Design of a Tunable Tetrode Electron Gun for Electron Beam Additive Manufacturing Device\",\"authors\":\"Zhenyi Zhang;Zijian Zhou;Keyan Sheng;Haozhe Li;Mianzhi Xiong;Jiangrui Xing;Chunjiang Lin;Jiang Huang\",\"doi\":\"10.1109/TPS.2024.3449088\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The electron gun, as a critical device for emitting high-speed electrons, determines the electron beam current and quality in electron beam additive manufacturing (EBAM). In this article, a tetrode electron gun with a control electrode is designed to improve the quality and controllability of the electron beam. The control electrode, optimized by parametric simulation, provides secondary confinement of the electron beam. This confinement aims to reduce the beam spot size and emittance while decoupling spot size from the current. Specifically, the maximum attainable current reaches 200 mA, while the beam waist radius contracts to a mere 1.09 mm. The normalized emittance, a crucial parameter, measures at \\n<inline-formula> <tex-math>$1.536\\\\times 10^{-{7}}~\\\\text {m}\\\\cdot \\\\text {rad}$ </tex-math></inline-formula>\\n. Furthermore, stability analysis of the electron gun explores the influence of electrode potential on its performance. By co-regulating the bias voltage and the control voltage, the electron beam current can smoothly rise to 200 mA while maintaining the beam spot radius of 2 mm. This article indicates the tetrode electron gun’s potential for precise control, thereby improving the quality and precision of high melting point alloy additive manufacturing processes.\",\"PeriodicalId\":450,\"journal\":{\"name\":\"IEEE Transactions on Plasma Science\",\"volume\":\"52 7\",\"pages\":\"2760-2765\"},\"PeriodicalIF\":1.3000,\"publicationDate\":\"2024-09-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Transactions on Plasma Science\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://ieeexplore.ieee.org/document/10680254/\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"PHYSICS, FLUIDS & PLASMAS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Plasma Science","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/10680254/","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, FLUIDS & PLASMAS","Score":null,"Total":0}
Electrostatic Design of a Tunable Tetrode Electron Gun for Electron Beam Additive Manufacturing Device
The electron gun, as a critical device for emitting high-speed electrons, determines the electron beam current and quality in electron beam additive manufacturing (EBAM). In this article, a tetrode electron gun with a control electrode is designed to improve the quality and controllability of the electron beam. The control electrode, optimized by parametric simulation, provides secondary confinement of the electron beam. This confinement aims to reduce the beam spot size and emittance while decoupling spot size from the current. Specifically, the maximum attainable current reaches 200 mA, while the beam waist radius contracts to a mere 1.09 mm. The normalized emittance, a crucial parameter, measures at
$1.536\times 10^{-{7}}~\text {m}\cdot \text {rad}$
. Furthermore, stability analysis of the electron gun explores the influence of electrode potential on its performance. By co-regulating the bias voltage and the control voltage, the electron beam current can smoothly rise to 200 mA while maintaining the beam spot radius of 2 mm. This article indicates the tetrode electron gun’s potential for precise control, thereby improving the quality and precision of high melting point alloy additive manufacturing processes.
期刊介绍:
The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.