扩展前真空压力等离子阴极带状电子束源的工作压力范围

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Aleksandr S. Klimov;Ilya Yu Bakeev;Ebroem Joel-Eric Dagri;Anna V. Dolgova;Efim M. Oks;Aleksey A. Zenin
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引用次数: 0

摘要

我们测量了从辅助放电单元到主放电空心阴极的电子通量与工作气体压力和气体种类的函数关系,并确定了主放电点火电压与辅助放电电流的关系。在 0.1-20 Pa 的扩展工作压力范围内,该源能够产生电子能量为 5 keV、电流密度为 10 mA/cm2 的带状电子束 ( $20\times 2$ cm2),而电子束沿长度方向的不均匀性小于 10%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Extending the Operating Pressure Range of a Forevacuum-Pressure Plasma-Cathode Ribbon Electron Beam Source
We show that the use of a two-stage discharge system—an extended hollow-cathode main discharge system with an auxiliary hollow-cathode discharge system mounted on the ends of the main discharge region—extends the operating pressure range toward a lower pressure range, down to 0.1 Pa. We have measured the electron flux from the auxiliary discharge cells to the hollow cathode of the main discharge as a function of operating gas pressure and the gas species and determined the dependence of main discharge ignition voltage on auxiliary discharge current. In the extended operating pressure range of 0.1–20 Pa, the source is capable of generating ribbon electron beams ( $20\times 2$ cm2) at an electron energy of 5 keV and a current density of 10 mA/cm2, while the nonuniformity along the length of the beam is less than 10%.
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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