MW 级微波脉冲压缩器中低压等离子体干扰开关性能的实验评估

IF 1.3 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2024-09-10 DOI:10.1109/TPS.2024.3445718

Vasilios A. Tantanis;Stylianos P. Savaidis;Zisis C. Ioannidis;Dimitra I. Kaklamani;Nikolaos K. Uzunoglu

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引用次数: 0

摘要

实验研究了在兆瓦级微波脉冲压缩（MPC）系统中运行的气体放电管（GDT）开关。所研究的气体放电管在低压条件下以恒定的气体吸入量运行。实验活动旨在评估 GDT 设计和运行参数对 MPC 性能的影响。评估的设计参数涉及 GDT 的尺寸和气体流动方向，而运行参数则涉及不同 MPC 驱动功率和脉冲重复频率（PRF）条件下的 GDT 气体压力和流量。实验结果表明，在优化选择设计参数值和动态调整运行参数的情况下，可实现最佳的 MPC 性能。在这种最佳设置下，由 10 kW 源驱动的 MPC 系统可在 PRF 为 500 Hz 时达到兆瓦级输出功率水平。

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Experimental Assessment of Low-Pressure Plasma Interference-Switch Performance in MW-Class Microwave Pulse Compressor

A gas discharge tube (GDT) switch operating in a MW-class microwave pulse compression (MPC) system is experimentally studied. The examined GDT operates at low-pressure conditions with constant gas intake. The experimental campaign aims to evaluate the influence of the GDT design and operational parameters on the MPC performance. The evaluated design parameters concern the GDT size and the gas flow direction, whereas the operational parameters the GDT gas pressure and flow rate at different MPC drive power and pulse repetition frequency (PRF) conditions. Experimental results show that under optimal selection of the design parameter values and a dynamic adjustment of the operational parameters, an optimal MPC performance is achieved. Under such optimal setup, the MPC system driven by 10 kW source achieves a MW-class output power level performance up to a PRF of 500 Hz.

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.