利用飞秒激光双光束干涉直接写入技术在硅片上高效制造出远超衍射极限的高质量纳米研磨层

IF 4.6 2区物理与天体物理 Q1 OPTICS

Optics and Laser Technology Pub Date : 2024-09-09 DOI:10.1016/j.optlastec.2024.111505

Kang Li , Ruozhong Han , Mengqi Suo , Mingquan Long , Long Chen , Kaiqiang Cao , Shian Zhang , Donghai Feng , Tianqing Jia , Zhenrong Sun , Hongxing Xu

{"title":"利用飞秒激光双光束干涉直接写入技术在硅片上高效制造出远超衍射极限的高质量纳米研磨层","authors":"Kang Li , Ruozhong Han , Mengqi Suo , Mingquan Long , Long Chen , Kaiqiang Cao , Shian Zhang , Donghai Feng , Tianqing Jia , Zhenrong Sun , Hongxing Xu","doi":"10.1016/j.optlastec.2024.111505","DOIUrl":null,"url":null,"abstract":"<div><p>This study demonstrated a femtosecond laser dual-beam interference direct writing (DBIDW) method for fabricating high-quality nanogratings on silicon. The nanogratings had Λ/2, Λ/3, and Λ/4 periods, with Λ slightly smaller than the laser wavelength. The grating stripes exhibited extremely smooth and straight edges, with an average line edge roughness (LER) of 2.23 nm and a difference in structural orientation angle (DSOA) of 2.3°. The formation mechanism involves interference enhancement inducing nanoplasma formation in periodic stripes, while local asymmetric enhancement by surface plasmons significantly increases light intensity inside the nanogrooves. This method greatly reduces thermal effects and debris deposition, offering significant advantages for high-efficiency, low-cost, large-area nanolithography.</p></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"181 ","pages":"Article 111505"},"PeriodicalIF":4.6000,"publicationDate":"2024-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"High quality nanogratings far beyond diffraction limits on silicon efficiently fabricated using femtosecond laser dual-beam interference direct writing\",\"authors\":\"Kang Li , Ruozhong Han , Mengqi Suo , Mingquan Long , Long Chen , Kaiqiang Cao , Shian Zhang , Donghai Feng , Tianqing Jia , Zhenrong Sun , Hongxing Xu\",\"doi\":\"10.1016/j.optlastec.2024.111505\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>This study demonstrated a femtosecond laser dual-beam interference direct writing (DBIDW) method for fabricating high-quality nanogratings on silicon. The nanogratings had Λ/2, Λ/3, and Λ/4 periods, with Λ slightly smaller than the laser wavelength. The grating stripes exhibited extremely smooth and straight edges, with an average line edge roughness (LER) of 2.23 nm and a difference in structural orientation angle (DSOA) of 2.3°. The formation mechanism involves interference enhancement inducing nanoplasma formation in periodic stripes, while local asymmetric enhancement by surface plasmons significantly increases light intensity inside the nanogrooves. This method greatly reduces thermal effects and debris deposition, offering significant advantages for high-efficiency, low-cost, large-area nanolithography.</p></div>\",\"PeriodicalId\":19511,\"journal\":{\"name\":\"Optics and Laser Technology\",\"volume\":\"181 \",\"pages\":\"Article 111505\"},\"PeriodicalIF\":4.6000,\"publicationDate\":\"2024-09-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optics and Laser Technology\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0030399224009630\",\"RegionNum\":2,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"OPTICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optics and Laser Technology","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0030399224009630","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"OPTICS","Score":null,"Total":0}

引用次数: 0

摘要

这项研究展示了一种飞秒激光双光束干涉直写（DBIDW）方法，用于在硅片上制造高质量的纳米压痕。纳米光栅的周期分别为Λ/2、Λ/3和Λ/4，其中Λ略小于激光波长。光栅条纹的边缘非常光滑平直，平均线边缘粗糙度（LER）为 2.23 nm，结构取向角差值（DSOA）为 2.3°。其形成机制包括干涉增强诱导周期性条纹中纳米等离子体的形成，而表面等离子体的局部不对称增强显著提高了纳米沟槽内的光强度。这种方法大大降低了热效应和碎片沉积，为高效、低成本、大面积纳米光刻技术提供了显著优势。

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High quality nanogratings far beyond diffraction limits on silicon efficiently fabricated using femtosecond laser dual-beam interference direct writing

This study demonstrated a femtosecond laser dual-beam interference direct writing (DBIDW) method for fabricating high-quality nanogratings on silicon. The nanogratings had Λ/2, Λ/3, and Λ/4 periods, with Λ slightly smaller than the laser wavelength. The grating stripes exhibited extremely smooth and straight edges, with an average line edge roughness (LER) of 2.23 nm and a difference in structural orientation angle (DSOA) of 2.3°. The formation mechanism involves interference enhancement inducing nanoplasma formation in periodic stripes, while local asymmetric enhancement by surface plasmons significantly increases light intensity inside the nanogrooves. This method greatly reduces thermal effects and debris deposition, offering significant advantages for high-efficiency, low-cost, large-area nanolithography.

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来源期刊

Optics and Laser Technology 物理-光学

CiteScore

8.50

自引率

10.00%

发文量

1060

审稿时长

3.4 months

期刊介绍： Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication. The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas: •development in all types of lasers •developments in optoelectronic devices and photonics •developments in new photonics and optical concepts •developments in conventional optics, optical instruments and components •techniques of optical metrology, including interferometry and optical fibre sensors •LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow •applications of lasers to materials processing, optical NDT display (including holography) and optical communication •research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume) •developments in optical computing and optical information processing •developments in new optical materials •developments in new optical characterization methods and techniques •developments in quantum optics •developments in light assisted micro and nanofabrication methods and techniques •developments in nanophotonics and biophotonics •developments in imaging processing and systems