不同掺杂元素组合对金属有机沉积衍生 YBa2Cu3O7-δ 纳米复合薄膜的磁通钉效应

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Jing Chen , Xinghang Zhou , Rongtie Huang , Minjuan Li , Zhiyong Liu , Chuanbing Cai
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引用次数: 0

摘要

事实证明,元素掺杂能有效改善钇钡铜氧化物(YBa2Cu3O7-δ,YBCO)纳米复合薄膜的磁通钉凝效应。在本研究中,我们将掺杂元素的数量增加到五个,以研究 YBCO 的磁通钉凝效应。我们系统地研究了掺杂 Zr,掺杂 Zr、Hf 和 Sn,掺杂 Zr、Hf、Sn 和 Ta,以及掺杂 Zr、Hf、Sn、Ta 和 Mn 的 YBCO 薄膜,这些薄膜沉积在 LaMnO3/MgO/Y2O3/Al2O3/ 哈氏合金基底上。样品采用低氟金属有机沉积法制备,总掺杂量为 8 摩尔%。所有薄膜都表现出良好的 c 轴生长,多掺杂有助于细化表面颗粒,使表面更加光滑。共掺杂 Zr、Hf、Sn、Ta 和 Mn 五种元素的薄膜在 30 K 和 1 T 下的引脚力密度(Fp)和临界电流密度(Jc)比未掺杂的薄膜分别高出约 3 倍和 1.6 倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The flux pinning effect of different doping element combinations on metal-organic deposition-derived YBa2Cu3O7−δ nanocomposite films

Elemental doping has been proven effective in improving the flux pinning of yttrium barium copper oxide (YBa2Cu3O7−δ, YBCO) nanocomposite thin films. In the present work, we increased the number of doping elements to five to investigate the flux pinning effect of YBCO. The Zr-doped, Zr, Hf and Sn co-doped, Zr, Hf, Sn and Ta co-doped, and Zr, Hf, Sn, Ta and Mn co-doped YBCO films deposited on LaMnO3/MgO/Y2O3/Al2O3/ Hastelloy substrate were systematically studied. The samples were prepared by low-fluorine metal-organic deposition method, with a total dopant of 8 mol%. All films exhibit good c-axis growth and the multi-doping helps refining the surface particles, resulting in a smoother surface. The in-field properties of the films increase with the increase of co-doped element numbers, especially at a low temperature of 30 K. The pinning force density (Fp) and critical current density (Jc) are significantly improved by five-element Zr, Hf, Sn, Ta and Mn co-doped, which is about 3 times and 1.6 times higher, respectively, than that of the undoped film at 30 K and 1 T.

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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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