分析高压氮化镓器件中不同栅极驱动参数下的误导通事件

IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Nishant Kashyap , Arghyadeep Sarkar
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引用次数: 0

摘要

本文从电路和器件参数的角度探讨了半桥氮化镓功率转换器中的误导通效应问题。模型显示,固有的误导通问题是由导通和关断阶段发生的开关瞬态时的回转率 dvdsdt 和 dvgsdtd 引起的。研究表明,dvdsdt 取决于器件内部参数,如 gfs(跨导)和 Coss(输出电容)。从 CV 特性可以明显看出,内部电容 Coss 和 Crss(反向传输电容)会随着漏极电压的升高而减小,从而实现更高的压摆率,这增加了出现误导通问题的概率。不同栅极驱动参数在 400 V 电压下多个工作点的实验结果支持上述分析。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analyzing false turn-on events with varying gate drive parameters in high voltage GaN devices

In this paper, we address the problem of false turn-on effects in a half-bridge GaN power converter in terms of circuit and device parameters. The model shows that the inherent false turn-on problem is caused by slew rates dvdsdt and dvgsdtduring the switching transients occurring at the turn-on and off phases. A higher slew rate propagates the gate driver voltage to overshoot beyond the threshold voltage causing it to accidentally turn on This study shows that dvdsdt is dependent on the internal device parameters such as gfs (transconductance) and Coss(output capacitance). From the CV characteristics, it is pretty much evident that the internal capacitances Cossand Crss (reverse transfer capacitance) are reduced with higher drain voltage enabling higher slew rates which increases the probability of false turn-on problems. Experimental results at numerous operating points at 400 V with the variation in different gate drive parameters support the analysis.

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来源期刊
Microelectronics Reliability
Microelectronics Reliability 工程技术-工程:电子与电气
CiteScore
3.30
自引率
12.50%
发文量
342
审稿时长
68 days
期刊介绍: Microelectronics Reliability, is dedicated to disseminating the latest research results and related information on the reliability of microelectronic devices, circuits and systems, from materials, process and manufacturing, to design, testing and operation. The coverage of the journal includes the following topics: measurement, understanding and analysis; evaluation and prediction; modelling and simulation; methodologies and mitigation. Papers which combine reliability with other important areas of microelectronics engineering, such as design, fabrication, integration, testing, and field operation will also be welcome, and practical papers reporting case studies in the field and specific application domains are particularly encouraged. Most accepted papers will be published as Research Papers, describing significant advances and completed work. Papers reviewing important developing topics of general interest may be accepted for publication as Review Papers. Urgent communications of a more preliminary nature and short reports on completed practical work of current interest may be considered for publication as Research Notes. All contributions are subject to peer review by leading experts in the field.
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