热退火过程中对 FeSe2 薄膜结晶度的现场监测以及退火对结构、光学和介电性质的影响

IF 1.5 4区 材料科学 Q3 Chemistry
Laila H. Gaabour, Atef Fayez Qasrawi, Seham R. Alharbi
{"title":"热退火过程中对 FeSe2 薄膜结晶度的现场监测以及退火对结构、光学和介电性质的影响","authors":"Laila H. Gaabour,&nbsp;Atef Fayez Qasrawi,&nbsp;Seham R. Alharbi","doi":"10.1002/crat.202400097","DOIUrl":null,"url":null,"abstract":"<p>Herein stacked layers of iron selenide (FeSe<sub>2</sub>) thin films are deposited by the physical evaporation technique and thermally annealed. An in situ monitoring of the crystallinity during the annealing process has shown that the crystallinity is reached at 100 °C. The crystallinity of the films that preferred the orthorhombic phase is enhanced with increasing annealing temperature. Evidences about the improved crystallinity are presented by the increased crystallite and grain sizes, decreased microstrain values, decreased stacking faults, and decreased defect densities with increasing annealing temperature. Optical investigations have shown impressive effect of the annealing process on the optical reflectance, optical contrast, and light absorbability. Namely, respective improvement percentages exceeding 170%, 64%, and 140% is achieved near E≈2 eV for samples annealed at 200 °C for 20 min. Both direct and indirect optical transitions are dominant in the film. In addition the annealing increased the dielectric constant in the spectral range of 1.17–4.20 eV. Maximum dielectric enhancement by 214% is reached near ≈2.10 eV. Moreover, the annealing process increases the optical conductivity and drift mobility of the FeSe<sub>2</sub> films. The improvement in the crystallinity that resulted in enhanced optical properties makes the thermally annealed FeSe<sub>2</sub> films promising for optoelectronic technology applications.</p>","PeriodicalId":48935,"journal":{"name":"Crystal Research and Technology","volume":"59 8","pages":""},"PeriodicalIF":1.5000,"publicationDate":"2024-07-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"In Situ Monitoring of Crystallinity of FeSe2 Thin Films During Thermal Annealing and the Annealing Effects on the Structural, Optical and Dielectric Properties\",\"authors\":\"Laila H. Gaabour,&nbsp;Atef Fayez Qasrawi,&nbsp;Seham R. Alharbi\",\"doi\":\"10.1002/crat.202400097\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>Herein stacked layers of iron selenide (FeSe<sub>2</sub>) thin films are deposited by the physical evaporation technique and thermally annealed. An in situ monitoring of the crystallinity during the annealing process has shown that the crystallinity is reached at 100 °C. The crystallinity of the films that preferred the orthorhombic phase is enhanced with increasing annealing temperature. Evidences about the improved crystallinity are presented by the increased crystallite and grain sizes, decreased microstrain values, decreased stacking faults, and decreased defect densities with increasing annealing temperature. Optical investigations have shown impressive effect of the annealing process on the optical reflectance, optical contrast, and light absorbability. Namely, respective improvement percentages exceeding 170%, 64%, and 140% is achieved near E≈2 eV for samples annealed at 200 °C for 20 min. Both direct and indirect optical transitions are dominant in the film. In addition the annealing increased the dielectric constant in the spectral range of 1.17–4.20 eV. Maximum dielectric enhancement by 214% is reached near ≈2.10 eV. Moreover, the annealing process increases the optical conductivity and drift mobility of the FeSe<sub>2</sub> films. The improvement in the crystallinity that resulted in enhanced optical properties makes the thermally annealed FeSe<sub>2</sub> films promising for optoelectronic technology applications.</p>\",\"PeriodicalId\":48935,\"journal\":{\"name\":\"Crystal Research and Technology\",\"volume\":\"59 8\",\"pages\":\"\"},\"PeriodicalIF\":1.5000,\"publicationDate\":\"2024-07-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Crystal Research and Technology\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/crat.202400097\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"Chemistry\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Crystal Research and Technology","FirstCategoryId":"88","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/crat.202400097","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"Chemistry","Score":null,"Total":0}
引用次数: 0

摘要

本文采用物理蒸发技术沉积叠层硒化铁(FeSe2)薄膜并进行热退火。对退火过程中的结晶度进行的原位监测表明,薄膜在 100 °C 时达到结晶度。正交相薄膜的结晶度随着退火温度的升高而提高。随着退火温度的升高,晶体尺寸和晶粒尺寸增大,微应变值减小,堆积断层减少,缺陷密度降低,这些都证明了结晶度的提高。光学研究表明,退火工艺对光学反射率、光学对比度和光吸收性的影响令人印象深刻。也就是说,在 200 °C 下退火 20 分钟的样品,在 E≈2 eV 附近的改进率分别超过了 170%、64% 和 140%。直接和间接光学转变在薄膜中均占主导地位。此外,退火还增加了 1.17-4.20 eV 光谱范围内的介电常数。在 ≈2.10 eV 附近,介电常数最大增强了 214%。此外,退火过程还提高了 FeSe2 薄膜的光导率和漂移迁移率。结晶度的提高导致了光学特性的增强,这使得热退火的 FeSe2 薄膜在光电技术应用中大有可为。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

In Situ Monitoring of Crystallinity of FeSe2 Thin Films During Thermal Annealing and the Annealing Effects on the Structural, Optical and Dielectric Properties

In Situ Monitoring of Crystallinity of FeSe2 Thin Films During Thermal Annealing and the Annealing Effects on the Structural, Optical and Dielectric Properties

Herein stacked layers of iron selenide (FeSe2) thin films are deposited by the physical evaporation technique and thermally annealed. An in situ monitoring of the crystallinity during the annealing process has shown that the crystallinity is reached at 100 °C. The crystallinity of the films that preferred the orthorhombic phase is enhanced with increasing annealing temperature. Evidences about the improved crystallinity are presented by the increased crystallite and grain sizes, decreased microstrain values, decreased stacking faults, and decreased defect densities with increasing annealing temperature. Optical investigations have shown impressive effect of the annealing process on the optical reflectance, optical contrast, and light absorbability. Namely, respective improvement percentages exceeding 170%, 64%, and 140% is achieved near E≈2 eV for samples annealed at 200 °C for 20 min. Both direct and indirect optical transitions are dominant in the film. In addition the annealing increased the dielectric constant in the spectral range of 1.17–4.20 eV. Maximum dielectric enhancement by 214% is reached near ≈2.10 eV. Moreover, the annealing process increases the optical conductivity and drift mobility of the FeSe2 films. The improvement in the crystallinity that resulted in enhanced optical properties makes the thermally annealed FeSe2 films promising for optoelectronic technology applications.

求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
CiteScore
2.50
自引率
6.70%
发文量
121
审稿时长
1.9 months
期刊介绍: The journal Crystal Research and Technology is a pure online Journal (since 2012). Crystal Research and Technology is an international journal examining all aspects of research within experimental, industrial, and theoretical crystallography. The journal covers the relevant aspects of -crystal growth techniques and phenomena (including bulk growth, thin films) -modern crystalline materials (e.g. smart materials, nanocrystals, quasicrystals, liquid crystals) -industrial crystallisation -application of crystals in materials science, electronics, data storage, and optics -experimental, simulation and theoretical studies of the structural properties of crystals -crystallographic computing
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信