{"title":"电离辐射缺陷与氮化镓基 III-V 半导体器件的可靠性:全面回顾","authors":"V. Sandeep , J. Charles Pravin , S. Ashok Kumar","doi":"10.1016/j.microrel.2024.115445","DOIUrl":null,"url":null,"abstract":"<div><p>The remote sensing and satellite community working for space organizations have expressed interest in building advanced devices with potential choices for Gallium Nitride based transistors. Radar and satellite communication applications employ nitride High Electron Mobility Transistors (HEMTs) due to their high radiation-absorbing and temperature tolerant qualities. However, they also deteriorate simultaneously upon such radiations that cause a drastic fall in their lifetimes. This article carries out reliability studies of GaN-based III-V semiconductor devices, including HEMTs, Schottky and thin film diodes by reviewing the defects induced by radiation. A review of the various kinds of defects induced in these devices upon subject to several radiation beams like proton, neutron, gamma, alpha, and other sources has been discussed here. GaN, when subject to high energy ionizing radiation particles, produce point defects in the material that are more dominated by extended disordered regions. Trap states also occur as a part of radiation damage with forbidden gaps consisting of deep thermal ionization energies, which causes the device’s mobility and electrical conductivity to decrease drastically. A short description on how these defects can be mitigated to a certain extent has been given, eying towards more withstanding capabilities for these devices in radiation-hardened environments.</p></div>","PeriodicalId":51131,"journal":{"name":"Microelectronics Reliability","volume":"159 ","pages":"Article 115445"},"PeriodicalIF":1.6000,"publicationDate":"2024-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Ionizing radiation defects and reliability of Gallium Nitride-based III-V semiconductor devices: A comprehensive review\",\"authors\":\"V. Sandeep , J. Charles Pravin , S. Ashok Kumar\",\"doi\":\"10.1016/j.microrel.2024.115445\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>The remote sensing and satellite community working for space organizations have expressed interest in building advanced devices with potential choices for Gallium Nitride based transistors. Radar and satellite communication applications employ nitride High Electron Mobility Transistors (HEMTs) due to their high radiation-absorbing and temperature tolerant qualities. However, they also deteriorate simultaneously upon such radiations that cause a drastic fall in their lifetimes. This article carries out reliability studies of GaN-based III-V semiconductor devices, including HEMTs, Schottky and thin film diodes by reviewing the defects induced by radiation. A review of the various kinds of defects induced in these devices upon subject to several radiation beams like proton, neutron, gamma, alpha, and other sources has been discussed here. GaN, when subject to high energy ionizing radiation particles, produce point defects in the material that are more dominated by extended disordered regions. Trap states also occur as a part of radiation damage with forbidden gaps consisting of deep thermal ionization energies, which causes the device’s mobility and electrical conductivity to decrease drastically. A short description on how these defects can be mitigated to a certain extent has been given, eying towards more withstanding capabilities for these devices in radiation-hardened environments.</p></div>\",\"PeriodicalId\":51131,\"journal\":{\"name\":\"Microelectronics Reliability\",\"volume\":\"159 \",\"pages\":\"Article 115445\"},\"PeriodicalIF\":1.6000,\"publicationDate\":\"2024-06-25\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Microelectronics Reliability\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0026271424001252\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Microelectronics Reliability","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0026271424001252","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Ionizing radiation defects and reliability of Gallium Nitride-based III-V semiconductor devices: A comprehensive review
The remote sensing and satellite community working for space organizations have expressed interest in building advanced devices with potential choices for Gallium Nitride based transistors. Radar and satellite communication applications employ nitride High Electron Mobility Transistors (HEMTs) due to their high radiation-absorbing and temperature tolerant qualities. However, they also deteriorate simultaneously upon such radiations that cause a drastic fall in their lifetimes. This article carries out reliability studies of GaN-based III-V semiconductor devices, including HEMTs, Schottky and thin film diodes by reviewing the defects induced by radiation. A review of the various kinds of defects induced in these devices upon subject to several radiation beams like proton, neutron, gamma, alpha, and other sources has been discussed here. GaN, when subject to high energy ionizing radiation particles, produce point defects in the material that are more dominated by extended disordered regions. Trap states also occur as a part of radiation damage with forbidden gaps consisting of deep thermal ionization energies, which causes the device’s mobility and electrical conductivity to decrease drastically. A short description on how these defects can be mitigated to a certain extent has been given, eying towards more withstanding capabilities for these devices in radiation-hardened environments.
期刊介绍:
Microelectronics Reliability, is dedicated to disseminating the latest research results and related information on the reliability of microelectronic devices, circuits and systems, from materials, process and manufacturing, to design, testing and operation. The coverage of the journal includes the following topics: measurement, understanding and analysis; evaluation and prediction; modelling and simulation; methodologies and mitigation. Papers which combine reliability with other important areas of microelectronics engineering, such as design, fabrication, integration, testing, and field operation will also be welcome, and practical papers reporting case studies in the field and specific application domains are particularly encouraged.
Most accepted papers will be published as Research Papers, describing significant advances and completed work. Papers reviewing important developing topics of general interest may be accepted for publication as Review Papers. Urgent communications of a more preliminary nature and short reports on completed practical work of current interest may be considered for publication as Research Notes. All contributions are subject to peer review by leading experts in the field.