大气压下低频 Ar-NH3 绝缘屏障放电中 H2(a) 连续发射的动力学驱动力

IF 2.6 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL
Raphaël Robert, Françoise Massines, Luc Stafford
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引用次数: 0

摘要

利用时间分辨光学发射和吸收光谱分析了在大气压下均相辉光放电条件下运行的 50 kHz Ar-NH3 介质势垒放电。除了典型的 NH(A-X)、N2(C-B)和 Ar(2p-1s)跃迁之外,在 180 纳米到 250 纳米之间还检测到了与\({{text{H}}}_{2}}\left({{text{a}}^{3}{\Sigma }_{{text{g}}^{+}\right))态去激发有关的连续发射,并且在放电熄灭后持续了很长时间。在所研究的实验条件范围内、发射的 \({{text{H}}}_{2}\left({{text{a}}}^{3}{{text{g}}}^{+}\right)态是通过({{text{H}}}_{2}/left({{text{X}}}^{1}{text{g}}^{+}/right))态在放电过程中与 Ar(1s)态碰撞而填充、以及放电后振动激发的氨离子 (NH3+(v)) 的离解重组。NH3+(v) 由 Ar2+ 向 NH3 的电荷转移产生、它分裂成 \({{text{H}}}_{2}/left({{text{a}}}^{3}{Sigma}_{text{g}}^{+}/right))(或 \({{text{H}}}_{2}/left({{text{c}}}^{3}{Pi或({{text{H}}_{2}left({{text{d}}}^{3}{Pi}_{u}\right))和 NH 在气相中与一个低能电子重组时。和 NH。基于这一机制,我们改进了一维流体模型以包含这些反应,并用它模拟了 \({{text{H}}_{2}}left({{text{a}}^{3}{{Sigma }_{{text{g}}^{+}/right)\) 的发射强度,结果显示与实验数据非常吻合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Kinetics Driving H2(a) Continuum Emission in Low-Frequency Ar-NH3 Dielectric Barrier Discharges at Atmospheric Pressure

Kinetics Driving H2(a) Continuum Emission in Low-Frequency Ar-NH3 Dielectric Barrier Discharges at Atmospheric Pressure

Kinetics Driving H2(a) Continuum Emission in Low-Frequency Ar-NH3 Dielectric Barrier Discharges at Atmospheric Pressure

Time-resolved optical emission and absorption spectroscopy was used to analyze a 50 kHz Ar-NH3 dielectric barrier discharge operated in a homogeneous glow discharge regime at atmospheric pressure. In addition to the typical NH(A-X), N2(C-B), and Ar(2p-1s) transitions, a continuum emission linked to de-excitation of \({{\text{H}}}_{2}\left({{\text{a}}}^{3}{\Sigma }_{{\text{g}}}^{+}\right)\) states was detected between 180 and 250 nm and lasted for a long time after discharge extinction. Over the range of experimental conditions investigated, the emitting \({{\text{H}}}_{2}\left({{\text{a}}}^{3}{\Sigma }_{{\text{g}}}^{+}\right)\) states are proposed to be populated by collisions of \({{\text{H}}}_{2}\left({{\text{X}}}^{1}{\Sigma }_{{\text{g}}}^{+}\right)\) with Ar(1s) states during discharge, and by dissociative recombination of the vibrationally-excited ammonia ion (NH3+(v)) after the discharge. NH3+(v) is produced by charge transfer from Ar2+ to NH3, and it breaks into \({{\text{H}}}_{2}\left({{\text{a}}}^{3}{\Sigma }_{{\text{g}}}^{+}\right)\) (or \({{\text{H}}}_{2}\left({{\text{c}}}^{3}{\Pi }_{u}\right)\) or \({{\text{H}}}_{2}\left({{\text{d}}}^{3}{\Pi }_{u}\right)\)) and NH upon gas phase recombination with a low-energy electron. Based on this proposed mechanism, a 1D fluid model was refined to include these reactions and used to simulate the emission intensity from \({{\text{H}}}_{2}\left({{\text{a}}}^{3}{\Sigma }_{{\text{g}}}^{+}\right)\) and revealed good agreement with experimental data.

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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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