反向电荷注入双栅突触晶体管实现有效的重量更新

IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Donghyun Ryu;Junsu Yu;Woo Young Choi
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引用次数: 0

摘要

本文提出了反向电荷注入(RCI)双栅突触晶体管及其有效的权值更新方法。首先,讨论了所提出的 RCI 双栅突触晶体管的结构特征,并与我们之前的工作进行了比较。其次,通过分析耦合电容分量,讨论了所提出的突触晶体管的权重更新效率,耦合电容分量决定了隧道和阻塞氧化物上的电场分布。因此,程序电压和脉冲宽度分别降低了 56.4% 和 99.0%。重量更新操作的功耗降低了 99.6%。此外,还讨论了低擦除电压所产生的防反隧道效应。第三,通过调整底部栅极长度,优化了所提出的突触晶体管的权重更新条件。第四,通过增量阶跃脉冲编程(ISPP)和增量阶跃脉冲擦除(ISPE),所提出的突触晶体管实现了 16 个稳定状态(32 个具有抑制性突触的状态)和相当线性的权重更新。最后,在基于 RCI 双栅突触晶体管的 2 × 2 NOR 型阵列中验证了目标细胞的 PGM/ERS 操作和周围细胞的抑制操作。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reverse Charge Injection Dual-Gate Synaptic Transistors for Effective Weight Update
Reverse charge injection (RCI) dual-gate synaptic transistors and their effective weight update method are proposed. First, the structural features of the proposed RCI dual-gate synaptic transistors are discussed in comparison with our previous work. Second, the weight update efficiency of the proposed synaptic transistors is discussed by analyzing the coupling capacitance components, which determine the electric field distribution across the tunneling and blocking oxides. Consequently, the program voltage and pulse width are reduced by 56.4% and 99.0%, respectively. The power consumption for the weight update operation is lowered by 99.6%. In addition, the anti-back-tunneling effect resulting from the low erase voltage is discussed. Third, the weight update conditions of the proposed synaptic transistors are optimized by adjusting the bottom gate length. Fourth, the proposed synaptic transistors implement 16 stable states (32 states with inhibitory synapses) and a fairly linear weight update by using both the increment step pulse program (ISPP) and increment step pulse erase (ISPE). Finally, the PGM/ERS operation of target cell and inhibit operation of surrounding cells are verified in RCI dual-gate synaptic transistor-based 2 × 2 NOR-type array.
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来源期刊
IEEE Transactions on Nanotechnology
IEEE Transactions on Nanotechnology 工程技术-材料科学:综合
CiteScore
4.80
自引率
8.30%
发文量
74
审稿时长
8.3 months
期刊介绍: The IEEE Transactions on Nanotechnology is devoted to the publication of manuscripts of archival value in the general area of nanotechnology, which is rapidly emerging as one of the fastest growing and most promising new technological developments for the next generation and beyond.
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