优化工作频率的直流-直流升压转换器预测控制系统

Q4 Engineering
A. A. Cherdintsev
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引用次数: 0

摘要

摘要 预测控制系统可大大降低变流器的安装和开发成本。目前,现有的控制系统实施方法已显示出其有效性。然而,一些问题,如设备设计和配置的简易性、对负载参数变化的抵抗力等,仍然需要寻找新的方法来实现预测控制系统。本文介绍了一种修改直流-直流升压转换器预测控制系统模型的新方法。所开发的控制系统除了具有维持所需输出电压水平的功能外,还能优化设备的运行,以实现最高效率。研究表明,通过改变控制信号的占空比,可以调节输出电压水平;通过改变工作周期,可以调节设备效率。由于所需的计算能力降低,经修改的目标函数计算系统允许使用足够大的规划范围。仿真结果表明了所提控制方法的优势,包括快速瞬态响应和高度鲁棒性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Predictive Control System of a DC-DC Boost Converter with Optimization of the Operating Frequency

Predictive Control System of a DC-DC Boost Converter with Optimization of the Operating Frequency

Abstract

Predictive control systems can significantly reduce the cost of setting up and developing converters. Currently, existing methods for implementing control systems have shown their effectiveness. However, some problems, such as ease of design and configuration of the device, and resistance to changes in load parameters, still require searching for new approaches to implement predictive control systems. This paper presents a new method for modifying the predictive control system model for DC-DC boost converters. The developed control system, in addition to the function of maintaining the required level of output voltage, optimizes the operation of the device to achieve maximum efficiency. It is shown that the output voltage level is regulated by changing the duty cycle of the control signal; and the efficiency of the device, by changing the operating period. It is established that a modified system for calculating the objective function allows using a sufficiently large planning horizon due to the reduction in the required computing power. The presented simulation results demonstrate the advantages of the proposed control method, including a fast transient response and a high degree of robustness.

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来源期刊
Russian Microelectronics
Russian Microelectronics Materials Science-Materials Chemistry
CiteScore
0.70
自引率
0.00%
发文量
43
期刊介绍: Russian Microelectronics  covers physical, technological, and some VLSI and ULSI circuit-technical aspects of microelectronics and nanoelectronics; it informs the reader of new trends in submicron optical, x-ray, electron, and ion-beam lithography technology; dry processing techniques, etching, doping; and deposition and planarization technology. Significant space is devoted to problems arising in the application of proton, electron, and ion beams, plasma, etc. Consideration is given to new equipment, including cluster tools and control in situ and submicron CMOS, bipolar, and BICMOS technologies. The journal publishes papers addressing problems of molecular beam epitaxy and related processes; heterojunction devices and integrated circuits; the technology and devices of nanoelectronics; and the fabrication of nanometer scale devices, including new device structures, quantum-effect devices, and superconducting devices. The reader will find papers containing news of the diagnostics of surfaces and microelectronic structures, the modeling of technological processes and devices in micro- and nanoelectronics, including nanotransistors, and solid state qubits.
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