新型多等离子体喷射切向混合反应器:设计与炭黑生产

IF 2.6 3区 物理与天体物理 Q3 ENGINEERING, CHEMICAL
Xianhui Chen, Shaopeng Wang, Weidong Xia
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引用次数: 0

摘要

本文提出了一种新型多等离子体射流切向混合反应器(MPJ-TMR)。通过 CFD 仿真研究了不同切向圆直径对混合过程的影响。MPJ-TMR 已初步应用于高导电炭黑 (HCCB) 的制备。结果表明,切圆直径 dc/din = 0 的 MPJ-TMR 会形成 "逆流再循环区",阻碍等离子体射流和冷流体之间的混合。对于切圆直径 dc/din > 0 的 MPJ-TMR,"逆流再循环区 "的强度随着切圆直径的增大而减弱和消失。偏心撞击流促使流体围绕中心轴旋转。这样就形成了螺旋涡流结构,从而增强了混合效果。其中,切圆直径 dc/din = 0.5 的 MPJ-TMR 混合效率最高,因为其局部圆周速度和轴向涡流通量最大,等离子射流和冷流体之间的夹带效果良好。因此,采用切圆直径 dc/din = 0.5 的 MPJ-TMR 来制备炭黑。所制备的产品具有丰富的支链结构,90% 以上的主粒径分布在 10-20 nm 范围内。HCCB 的物理化学指数 DBP 吸收率、IAN 和电阻率与乙炔炭黑非常接近。反应器显示出优异的产品均匀性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

A Novel Multiple Plasma Jet Tangentially Mixed Reactor: Design and Carbon Black Production

A Novel Multiple Plasma Jet Tangentially Mixed Reactor: Design and Carbon Black Production

In this paper, a new multiple plasma jet tangentially mixed reactor (MPJ-TMR) is proposed. The impact of varying tangent circle diameters on the mixing process is investigated through CFD simulation. The MPJ-TMR has been preliminarily applied to high-conductive carbon black (HCCB) preparation. The results show that the MPJ-TMR with a tangent circle diameter dc/din = 0 is directed to form the "counter-flow recirculation zone", which impedes mixing between plasma jets and cold fluids. For the MPJ-TMR with a tangent circle diameter dc/din > 0, the intensity of the "counter-flow recirculation zone" weakens and disappears as the tangent circle diameter increases. The eccentric impact flow drives the fluid to spiral around the central axis. So that a spiral vortex structure is formed to enhance the mixing. Among them, the MPJ-TMR with a tangent circle diameter dc/din = 0.5 exhibits the best mixing efficiency due to its highest local circumferential velocity and axial vortex flux, resulting in good entrainment between plasma jets and cold fluids. Therefore, the MPJ-TMR with a tangent circle diameter dc/din = 0.5 is applied to prepare carbon black. The resulting products show a rich branched chain structure with over 90% of the primary particle size distributed within the range of 10–20 nm. The physicochemical indices DBP Absorption, IAN and resistivity of HCCB are very close to that of acetylene carbon black. The reactor demonstrates excellent product uniformity.

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来源期刊
Plasma Chemistry and Plasma Processing
Plasma Chemistry and Plasma Processing 工程技术-工程:化工
CiteScore
5.90
自引率
8.30%
发文量
73
审稿时长
6-12 weeks
期刊介绍: Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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