提高尼康 XY-2i 的性能

Stewart Lyle, Ruben Rodriguez, Patrick M. Troccolo
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引用次数: 0

摘要

由于需要提高掩膜套准测量的重复性,英特尔公司与尼康精密公司联合开展了一个项目,试图将其新型 XY-2I 的性能提高到 +/- 0.05μ 以上。实证实验的重点是控制和/或更精确地监测与干涉仪对空气和掩膜温度的补偿、干涉仪 X 和 Y 部分之间的温差、平板温度不均匀性以及不正确的平板气候化有关的误差。监测印版和 X/Y 干涉仪温度的氟橡胶温度探头显示,安装窗帘和精确定位的风扇、更好地放置尼康空气和掩膜温度传感器以及正确的印版气候调节消除了 X/Y 干涉仪温度差,提高了印版温度的稳定性和均匀性,并大大减少了空气和印版温度测量误差。长期重复性和残余正交测量均有很大改进,正交波动范围为 ^ +/- 0.14" 弧度,100 毫米以上的长期重复性为 ^ +/- 0.06μ。这些结果表明,只需进行一些简单而成本低廉的改装,就可以提高 XY-2I 的性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Improving Nikon XY-2i performance
Due to the need for better repeatability in mask registration measurement, Intel Corporation instigated a joint project with Nikon Precision Inc attempting to improve the performance of their new XY-2I to +/- 0.05μ over lOOmn. The empirical experimentation focused on controlling and/or more accurately monitoring the errors associated with interferometer compensation for air and mask temperature, temperature differences between the X and Y portions of the interferometer, plate temperature non-uniformity, and incorrect plate climatization. Flouroptic temperature probes monitoring plate and X/Y interferometer temperatures showed that installation of curtains and precisely-placed fans, better placement of Nikon air and mask temperature sensors, and proper plate climatization eliminated X/Y interferometer temperature differences, improved plate temperature stability and uniformity, and greatly reduced the air and plate temperature measurement errors. Long-term repeatability and residual-orthogonality measurements both showed large improvements with the range of orthogonality fluctuations ^ +/- 0.14” of arc and long-term repeatability ^ +/- 0.06μ over 100mm. These results indicate that with a few simple and inexpensive modifications, XY-2I performance improvement is possible.
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