用于光刻系统的可编程光掩膜

Photomask Technology Pub Date : 2023-11-21 DOI:10.1117/12.2685213

Richard Beaudry, Md. Iftekharul Islam, A. Amnache, Maurice Delafosse, Luc Fréchette

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引用次数: 0

摘要

数字光刻缩短了开发周期。激光光刻速度慢，叠加精度低。DIGITHO 可编程光掩膜适合标准光刻步进机，无需对系统进行修改。它可以为每次曝光生成不同的掩膜。DIGITHO 为芯片级系列化、快速原型开发到高产能制造提供了最具成本效益的解决方案。

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Programmable photomask for photolithography systems

Digital lithography shortens development cycle time. Laser-based lithography is slow and lacks in overlay precision. The DIGITHO programmable photomask fits into standard photolithography steppers without system modifications. It can generate a different mask for each exposure. DIGITHO offers the most cost-effective solution for die-level serialization and fast prototyping to high throughput manufacturing.

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Photomask Technology

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