Tomohiro Suzuki, Ryo Watanabe, Shohei Sakuma, Tomoro Ide
{"title":"用于高核可见光 EUV 光刻技术的阳极坯料检测","authors":"Tomohiro Suzuki, Ryo Watanabe, Shohei Sakuma, Tomoro Ide","doi":"10.1117/12.2686239","DOIUrl":null,"url":null,"abstract":"Lasertec develops and manufactures inspection and measurement systems that meet the requirements of EUV lithography. Lasertec has successfully developed an actinic blank inspection (ABI) tool and released ABICS E120, a EUV mask blank inspection and review system that contributes to defect management and yield improvement in the production of EUV mask blanks. With the introduction of high-NA EUV scanners and the further progress of process nodes, actinic inspection tools will need to detect even smaller defects. Lasertec is developing a next-generation ABICS for such advanced nodes, eyeing its release in 2024. Its target performance is a sensitivity to detect defects 1nm high and 30nm wide with a coordinate accuracy of 10nm.","PeriodicalId":235881,"journal":{"name":"Photomask Technology","volume":"54 5-6","pages":"127510E - 127510E-7"},"PeriodicalIF":0.0000,"publicationDate":"2023-11-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Actinic blank inspection for high-NA EUV lithography\",\"authors\":\"Tomohiro Suzuki, Ryo Watanabe, Shohei Sakuma, Tomoro Ide\",\"doi\":\"10.1117/12.2686239\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Lasertec develops and manufactures inspection and measurement systems that meet the requirements of EUV lithography. Lasertec has successfully developed an actinic blank inspection (ABI) tool and released ABICS E120, a EUV mask blank inspection and review system that contributes to defect management and yield improvement in the production of EUV mask blanks. With the introduction of high-NA EUV scanners and the further progress of process nodes, actinic inspection tools will need to detect even smaller defects. Lasertec is developing a next-generation ABICS for such advanced nodes, eyeing its release in 2024. Its target performance is a sensitivity to detect defects 1nm high and 30nm wide with a coordinate accuracy of 10nm.\",\"PeriodicalId\":235881,\"journal\":{\"name\":\"Photomask Technology\",\"volume\":\"54 5-6\",\"pages\":\"127510E - 127510E-7\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-11-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Photomask Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2686239\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Photomask Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2686239","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Actinic blank inspection for high-NA EUV lithography
Lasertec develops and manufactures inspection and measurement systems that meet the requirements of EUV lithography. Lasertec has successfully developed an actinic blank inspection (ABI) tool and released ABICS E120, a EUV mask blank inspection and review system that contributes to defect management and yield improvement in the production of EUV mask blanks. With the introduction of high-NA EUV scanners and the further progress of process nodes, actinic inspection tools will need to detect even smaller defects. Lasertec is developing a next-generation ABICS for such advanced nodes, eyeing its release in 2024. Its target performance is a sensitivity to detect defects 1nm high and 30nm wide with a coordinate accuracy of 10nm.
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