用于缓解自热效应的无结和反转模式纳米片场效应晶体管对比分析

IF 1.9 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Do Gyun An, Garam Kim, Hyunwoo Kim, Sangwan Kim, Jang Hyun Kim
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引用次数: 0

摘要

人工智能计算需要中央处理单元和图形处理单元等硬件进行数据处理。然而,计算过程中产生的过多热量仍然是一个挑战。本文的重点是晶体管结构导致的逻辑器件发热问题。为解决这一问题,本文研究了无结场效应晶体管(JLFET)的工作机制。JLFET 在缓解热相关问题方面显示出潜力,并与其他纳米片 (ns) FET 进行了比较。与 Con-nsFET 相比,JL-nsFET 的迁移率随温度升高而发生的变化较小,因此对晶格散射的敏感性较低,在自热效应情况下,Con-nsFET 的热阻(Rth)为 0.43 [K µW-1],而 JL-nsFET 的热阻(Rth)为 0.414 [K µW-1]。JL-nsFET 的 Rth 小于 Con-nsFET 的原因是,JL-nsFET 采用了源热注入传导机制,并通过使用散装沟道获得了较大的传热面积。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Comparative analysis of junctionless and inversion-mode nanosheet FETs for self-heating effect mitigation
Artificial intelligence computing requires hardware like central processing units and graphic processing units for data processing. However, excessive heat generated during computations remains a challenge. The paper focuses on the heat issue in logic devices caused by transistor structures. To address the problem, the operational mechanism of the Junctionless Field-Effect Transistor (JLFET) is investigated. JLFET shows potential in mitigating heat-related issues and is compared to other nanosheet (ns) FETs. In the case of JL-nsFET, the change in mobility with increasing temperature is smaller compared to Con-nsFET, resulting in less susceptibility to lattice scattering and thermal resistance (Rth) in self-heating effect situation is 0.43 [K µW−1] for Con-nsFET and 0.414 [K µW−1] for JL-nsFET. The reason why the Rth of JL-nsFET is smaller than that of Con-nsFET is that JL-nsFET uses a source heat injection conduction mechanism and a large heat transfer area by using a bulk channel.
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来源期刊
Semiconductor Science and Technology
Semiconductor Science and Technology 工程技术-材料科学:综合
CiteScore
4.30
自引率
5.30%
发文量
216
审稿时长
2.4 months
期刊介绍: Devoted to semiconductor research, Semiconductor Science and Technology''s multidisciplinary approach reflects the far-reaching nature of this topic. The scope of the journal covers fundamental and applied experimental and theoretical studies of the properties of non-organic, organic and oxide semiconductors, their interfaces and devices, including: fundamental properties materials and nanostructures devices and applications fabrication and processing new analytical techniques simulation emerging fields: materials and devices for quantum technologies hybrid structures and devices 2D and topological materials metamaterials semiconductors for energy flexible electronics.
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