石墨相氮化碳高效光催化制氢前驱体的预处理策略

IF 1.9 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Fengyan Niu, Qisheng He, Shiran Wu, Weiyan Lei, Yi Shen
{"title":"石墨相氮化碳高效光催化制氢前驱体的预处理策略","authors":"Fengyan Niu, Qisheng He, Shiran Wu, Weiyan Lei, Yi Shen","doi":"10.1088/1361-6641/acff13","DOIUrl":null,"url":null,"abstract":"Abstract The most sustainable preparation method for nanostructured materials must be urgently determined. In particular, the influence of different precursor pretreatment strategies on the structure and photocatalytic performance of highly attractive Graphitic carbon nitride photocatalyst is necessary to determine the most effective precursor pretreatment strategy. In this paper, three different precursor pretreatment methods were used to prepare g-C 3 N 4 materials, so namely direct mixing (CN-C), freeze-drying, hydrothermal (CN-H) with thermal condensation polymerization two-step method processed urea, melamine and NH 4 Cl precursor mixtures. The results showed that NH 4 Cl, as a template, would not destroy the integrity of the tristriazine structural units in the product, and the CN-H sample had a lamellar structure, and the specific surface area and pore volume of the sample increased, which could provide more active reaction sites for photocatalytic H 2 production, had the highest and most stable H 2 evolution rate, up to 118.4 μ mol g −1 , about 1.7 times CN-C’s. This strategy provides a new idea for the design of g-C 3 N 4 photocatalyst.","PeriodicalId":21585,"journal":{"name":"Semiconductor Science and Technology","volume":"36 1","pages":"0"},"PeriodicalIF":1.9000,"publicationDate":"2023-10-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Pretreatment strategies of precursors for efficient photocatalytic hydrogen production of graphitic phase carbon nitride\",\"authors\":\"Fengyan Niu, Qisheng He, Shiran Wu, Weiyan Lei, Yi Shen\",\"doi\":\"10.1088/1361-6641/acff13\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Abstract The most sustainable preparation method for nanostructured materials must be urgently determined. In particular, the influence of different precursor pretreatment strategies on the structure and photocatalytic performance of highly attractive Graphitic carbon nitride photocatalyst is necessary to determine the most effective precursor pretreatment strategy. In this paper, three different precursor pretreatment methods were used to prepare g-C 3 N 4 materials, so namely direct mixing (CN-C), freeze-drying, hydrothermal (CN-H) with thermal condensation polymerization two-step method processed urea, melamine and NH 4 Cl precursor mixtures. The results showed that NH 4 Cl, as a template, would not destroy the integrity of the tristriazine structural units in the product, and the CN-H sample had a lamellar structure, and the specific surface area and pore volume of the sample increased, which could provide more active reaction sites for photocatalytic H 2 production, had the highest and most stable H 2 evolution rate, up to 118.4 μ mol g −1 , about 1.7 times CN-C’s. This strategy provides a new idea for the design of g-C 3 N 4 photocatalyst.\",\"PeriodicalId\":21585,\"journal\":{\"name\":\"Semiconductor Science and Technology\",\"volume\":\"36 1\",\"pages\":\"0\"},\"PeriodicalIF\":1.9000,\"publicationDate\":\"2023-10-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Semiconductor Science and Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1088/1361-6641/acff13\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Semiconductor Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/1361-6641/acff13","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

摘要

摘要纳米结构材料的可持续制备方法亟待确定。特别是,不同前驱体预处理策略对高吸引力的氮化石墨碳光催化剂的结构和光催化性能的影响是确定最有效的前驱体预处理策略的必要条件。本文采用三种不同的前驱体预处理方法制备了g- c3n4材料,即直接混合法(CN-C)、冷冻干燥法、水热法(CN-H)与热缩聚法两步法制备了尿素、三聚氰胺和nh4cl前驱体混合物。结果表明,nh4 Cl作为模板不会破坏产物中三三嗪结构单元的完整性,CN-H样品具有片层状结构,样品的比表面积和孔体积增大,可以为光催化生成h2提供更活跃的反应位点,具有最高和最稳定的h2析出速率,可达118.4 μ mol g−1,约为CN-C的1.7倍。该策略为g- c3n4光催化剂的设计提供了新的思路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Pretreatment strategies of precursors for efficient photocatalytic hydrogen production of graphitic phase carbon nitride
Abstract The most sustainable preparation method for nanostructured materials must be urgently determined. In particular, the influence of different precursor pretreatment strategies on the structure and photocatalytic performance of highly attractive Graphitic carbon nitride photocatalyst is necessary to determine the most effective precursor pretreatment strategy. In this paper, three different precursor pretreatment methods were used to prepare g-C 3 N 4 materials, so namely direct mixing (CN-C), freeze-drying, hydrothermal (CN-H) with thermal condensation polymerization two-step method processed urea, melamine and NH 4 Cl precursor mixtures. The results showed that NH 4 Cl, as a template, would not destroy the integrity of the tristriazine structural units in the product, and the CN-H sample had a lamellar structure, and the specific surface area and pore volume of the sample increased, which could provide more active reaction sites for photocatalytic H 2 production, had the highest and most stable H 2 evolution rate, up to 118.4 μ mol g −1 , about 1.7 times CN-C’s. This strategy provides a new idea for the design of g-C 3 N 4 photocatalyst.
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来源期刊
Semiconductor Science and Technology
Semiconductor Science and Technology 工程技术-材料科学:综合
CiteScore
4.30
自引率
5.30%
发文量
216
审稿时长
2.4 months
期刊介绍: Devoted to semiconductor research, Semiconductor Science and Technology''s multidisciplinary approach reflects the far-reaching nature of this topic. The scope of the journal covers fundamental and applied experimental and theoretical studies of the properties of non-organic, organic and oxide semiconductors, their interfaces and devices, including: fundamental properties materials and nanostructures devices and applications fabrication and processing new analytical techniques simulation emerging fields: materials and devices for quantum technologies hybrid structures and devices 2D and topological materials metamaterials semiconductors for energy flexible electronics.
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