Fengyan Niu, Qisheng He, Shiran Wu, Weiyan Lei, Yi Shen
{"title":"石墨相氮化碳高效光催化制氢前驱体的预处理策略","authors":"Fengyan Niu, Qisheng He, Shiran Wu, Weiyan Lei, Yi Shen","doi":"10.1088/1361-6641/acff13","DOIUrl":null,"url":null,"abstract":"Abstract The most sustainable preparation method for nanostructured materials must be urgently determined. In particular, the influence of different precursor pretreatment strategies on the structure and photocatalytic performance of highly attractive Graphitic carbon nitride photocatalyst is necessary to determine the most effective precursor pretreatment strategy. In this paper, three different precursor pretreatment methods were used to prepare g-C 3 N 4 materials, so namely direct mixing (CN-C), freeze-drying, hydrothermal (CN-H) with thermal condensation polymerization two-step method processed urea, melamine and NH 4 Cl precursor mixtures. The results showed that NH 4 Cl, as a template, would not destroy the integrity of the tristriazine structural units in the product, and the CN-H sample had a lamellar structure, and the specific surface area and pore volume of the sample increased, which could provide more active reaction sites for photocatalytic H 2 production, had the highest and most stable H 2 evolution rate, up to 118.4 μ mol g −1 , about 1.7 times CN-C’s. This strategy provides a new idea for the design of g-C 3 N 4 photocatalyst.","PeriodicalId":21585,"journal":{"name":"Semiconductor Science and Technology","volume":"36 1","pages":"0"},"PeriodicalIF":1.9000,"publicationDate":"2023-10-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Pretreatment strategies of precursors for efficient photocatalytic hydrogen production of graphitic phase carbon nitride\",\"authors\":\"Fengyan Niu, Qisheng He, Shiran Wu, Weiyan Lei, Yi Shen\",\"doi\":\"10.1088/1361-6641/acff13\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Abstract The most sustainable preparation method for nanostructured materials must be urgently determined. In particular, the influence of different precursor pretreatment strategies on the structure and photocatalytic performance of highly attractive Graphitic carbon nitride photocatalyst is necessary to determine the most effective precursor pretreatment strategy. In this paper, three different precursor pretreatment methods were used to prepare g-C 3 N 4 materials, so namely direct mixing (CN-C), freeze-drying, hydrothermal (CN-H) with thermal condensation polymerization two-step method processed urea, melamine and NH 4 Cl precursor mixtures. The results showed that NH 4 Cl, as a template, would not destroy the integrity of the tristriazine structural units in the product, and the CN-H sample had a lamellar structure, and the specific surface area and pore volume of the sample increased, which could provide more active reaction sites for photocatalytic H 2 production, had the highest and most stable H 2 evolution rate, up to 118.4 μ mol g −1 , about 1.7 times CN-C’s. This strategy provides a new idea for the design of g-C 3 N 4 photocatalyst.\",\"PeriodicalId\":21585,\"journal\":{\"name\":\"Semiconductor Science and Technology\",\"volume\":\"36 1\",\"pages\":\"0\"},\"PeriodicalIF\":1.9000,\"publicationDate\":\"2023-10-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Semiconductor Science and Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1088/1361-6641/acff13\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Semiconductor Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/1361-6641/acff13","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
Pretreatment strategies of precursors for efficient photocatalytic hydrogen production of graphitic phase carbon nitride
Abstract The most sustainable preparation method for nanostructured materials must be urgently determined. In particular, the influence of different precursor pretreatment strategies on the structure and photocatalytic performance of highly attractive Graphitic carbon nitride photocatalyst is necessary to determine the most effective precursor pretreatment strategy. In this paper, three different precursor pretreatment methods were used to prepare g-C 3 N 4 materials, so namely direct mixing (CN-C), freeze-drying, hydrothermal (CN-H) with thermal condensation polymerization two-step method processed urea, melamine and NH 4 Cl precursor mixtures. The results showed that NH 4 Cl, as a template, would not destroy the integrity of the tristriazine structural units in the product, and the CN-H sample had a lamellar structure, and the specific surface area and pore volume of the sample increased, which could provide more active reaction sites for photocatalytic H 2 production, had the highest and most stable H 2 evolution rate, up to 118.4 μ mol g −1 , about 1.7 times CN-C’s. This strategy provides a new idea for the design of g-C 3 N 4 photocatalyst.
期刊介绍:
Devoted to semiconductor research, Semiconductor Science and Technology''s multidisciplinary approach reflects the far-reaching nature of this topic.
The scope of the journal covers fundamental and applied experimental and theoretical studies of the properties of non-organic, organic and oxide semiconductors, their interfaces and devices, including:
fundamental properties
materials and nanostructures
devices and applications
fabrication and processing
new analytical techniques
simulation
emerging fields:
materials and devices for quantum technologies
hybrid structures and devices
2D and topological materials
metamaterials
semiconductors for energy
flexible electronics.