Rohini P Patil, Ankita Shrikant Nikam, Shivanand Teli, Ashkan Vakilipour Takaloo, Rajanish K. Kamat, Tukaram D. Dongale, Pradip Kamble, Kalyanrao Garadkar K M
{"title":"非易失性双极电阻开关存储器件用NiFe2O4纳米颗粒","authors":"Rohini P Patil, Ankita Shrikant Nikam, Shivanand Teli, Ashkan Vakilipour Takaloo, Rajanish K. Kamat, Tukaram D. Dongale, Pradip Kamble, Kalyanrao Garadkar K M","doi":"10.1088/1361-6641/ad04eb","DOIUrl":null,"url":null,"abstract":"Abstract The existing work addresses the chemical synthesis of NiFe2O4 (NFO) nanoparticles (NPs) with the help of PVP as a capping agent and NiFe2O4 NPs are used as a switching layer material in memory device. For the confirmation of the materials phase, composition, and optical properties, various analytical techniques were used. By the support of the X-ray diffraction (XRD) technique, crystal structure (cubic spinel) and crystallite size (20.12 nm) were determined. Field emission scanning electron microscopy (FE-SEM) was used to confirm the material morphology. Raman Spectroscopy and Fourier Transform Infrared Spectroscopy (FT-IR) were applied to identify the of NiFe2O4 NPs functional groups. For the non-volatile memory device , Ag/NFO/FTO was fabricated, which shows bipolar resistive switching with good endurance (104 cycles) and retention (6 x 103 s). The I–V characteristics of the actual device indicates that the deposition order of the film is a decisive part in the device performance. Moreover, the conduction and resistive switching mechanism of the device were also carried out.","PeriodicalId":21585,"journal":{"name":"Semiconductor Science and Technology","volume":"30 1","pages":"0"},"PeriodicalIF":1.9000,"publicationDate":"2023-10-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"NiFe2O4 nanoparticles for non-volatile bipolar resistive switching memory device\",\"authors\":\"Rohini P Patil, Ankita Shrikant Nikam, Shivanand Teli, Ashkan Vakilipour Takaloo, Rajanish K. Kamat, Tukaram D. Dongale, Pradip Kamble, Kalyanrao Garadkar K M\",\"doi\":\"10.1088/1361-6641/ad04eb\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Abstract The existing work addresses the chemical synthesis of NiFe2O4 (NFO) nanoparticles (NPs) with the help of PVP as a capping agent and NiFe2O4 NPs are used as a switching layer material in memory device. For the confirmation of the materials phase, composition, and optical properties, various analytical techniques were used. By the support of the X-ray diffraction (XRD) technique, crystal structure (cubic spinel) and crystallite size (20.12 nm) were determined. Field emission scanning electron microscopy (FE-SEM) was used to confirm the material morphology. Raman Spectroscopy and Fourier Transform Infrared Spectroscopy (FT-IR) were applied to identify the of NiFe2O4 NPs functional groups. For the non-volatile memory device , Ag/NFO/FTO was fabricated, which shows bipolar resistive switching with good endurance (104 cycles) and retention (6 x 103 s). The I–V characteristics of the actual device indicates that the deposition order of the film is a decisive part in the device performance. Moreover, the conduction and resistive switching mechanism of the device were also carried out.\",\"PeriodicalId\":21585,\"journal\":{\"name\":\"Semiconductor Science and Technology\",\"volume\":\"30 1\",\"pages\":\"0\"},\"PeriodicalIF\":1.9000,\"publicationDate\":\"2023-10-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Semiconductor Science and Technology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1088/1361-6641/ad04eb\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Semiconductor Science and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/1361-6641/ad04eb","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
摘要
以PVP为封盖剂,化学合成了NiFe2O4纳米粒子(NPs),并将其用作存储器件的开关层材料。为了确定材料的相、组成和光学性质,使用了各种分析技术。在x射线衍射(XRD)技术的支持下,测定了晶体结构(立方尖晶石)和晶粒尺寸(20.12 nm)。采用场发射扫描电镜(FE-SEM)对材料形貌进行了表征。利用拉曼光谱和傅里叶变换红外光谱(FT-IR)对NiFe2O4 NPs的官能团进行了鉴定。对于非易失性存储器件,制备了Ag/NFO/FTO,其双极电阻开关具有良好的续航时间(104次循环)和保持时间(6 x 103 s)。实际器件的I-V特性表明,薄膜的沉积顺序是器件性能的决定性因素。此外,还研究了该器件的导通和电阻开关机理。
NiFe2O4 nanoparticles for non-volatile bipolar resistive switching memory device
Abstract The existing work addresses the chemical synthesis of NiFe2O4 (NFO) nanoparticles (NPs) with the help of PVP as a capping agent and NiFe2O4 NPs are used as a switching layer material in memory device. For the confirmation of the materials phase, composition, and optical properties, various analytical techniques were used. By the support of the X-ray diffraction (XRD) technique, crystal structure (cubic spinel) and crystallite size (20.12 nm) were determined. Field emission scanning electron microscopy (FE-SEM) was used to confirm the material morphology. Raman Spectroscopy and Fourier Transform Infrared Spectroscopy (FT-IR) were applied to identify the of NiFe2O4 NPs functional groups. For the non-volatile memory device , Ag/NFO/FTO was fabricated, which shows bipolar resistive switching with good endurance (104 cycles) and retention (6 x 103 s). The I–V characteristics of the actual device indicates that the deposition order of the film is a decisive part in the device performance. Moreover, the conduction and resistive switching mechanism of the device were also carried out.
期刊介绍:
Devoted to semiconductor research, Semiconductor Science and Technology''s multidisciplinary approach reflects the far-reaching nature of this topic.
The scope of the journal covers fundamental and applied experimental and theoretical studies of the properties of non-organic, organic and oxide semiconductors, their interfaces and devices, including:
fundamental properties
materials and nanostructures
devices and applications
fabrication and processing
new analytical techniques
simulation
emerging fields:
materials and devices for quantum technologies
hybrid structures and devices
2D and topological materials
metamaterials
semiconductors for energy
flexible electronics.