具有生产价值的WOW 3D集成技术,采用无凹凸互连和超薄工艺

T. Ohba
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引用次数: 3

摘要

讨论了三维(3D)集成的晶圆对晶圆(WOW)技术[1]。使用无凹凸互连和超薄晶圆的背对晶圆堆叠是替代传统微凸点和基于芯片的堆叠技术的关键特性[2]-[6]。对于模具到模具的内部电子连接,不需要涉及焊料凸点和铜柱的凸点工艺。晶圆超薄至~2 μm提供了小尺寸的优势,不仅在3D ic的总体积方面,而且在通硅过孔(tsv)的纵横比方面。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Production-worthy WOW 3D integration technology using bumpless interconnects and ultra-thinning processes
Wafer-on-Wafer (WOW) technology for three-dimensional (3D) integration is discussed [1]. Back-to-face wafer stacking using bumpless interconnects and ultra-thinning of wafers are key features used as alternatives to conventional micro-bumps and chip-based stacking technologies [2]-[6]. There is no need for a bump process involving solder bumps and Cu posts for die-to-die internal electronic connections. Ultra-thinning of wafers down to ~2 μm provides the advantage of a small form factor, not only in terms of the total volume of 3D ICs, but also the aspect ratio of through-silicon-vias (TSVs).
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