{"title":"短沟道双栅SOI mosfet的一般物理模型","authors":"Zheming Li, J. Woo","doi":"10.1109/SOI.1997.634945","DOIUrl":null,"url":null,"abstract":"Previous works on the modeling of short-channel double-gate devices in the above-threshold regime were based mainly on modifying the current expressions for bulk devices. These models would probably be of limited utility because they do not account for the central physical characteristic of the double-gate devices, namely the coupling of the two channels. In this paper, we present a general physical model which explicitly accounts for physical effects such as channel coupling and drain induced conductance enhancement (DICE). The model is a major extension of the single-gate SOI MOSFET model to the double-gate case.","PeriodicalId":344728,"journal":{"name":"1997 IEEE International SOI Conference Proceedings","volume":"299 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-10-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"A general physical model for short-channel double-gate SOI MOSFETS\",\"authors\":\"Zheming Li, J. Woo\",\"doi\":\"10.1109/SOI.1997.634945\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Previous works on the modeling of short-channel double-gate devices in the above-threshold regime were based mainly on modifying the current expressions for bulk devices. These models would probably be of limited utility because they do not account for the central physical characteristic of the double-gate devices, namely the coupling of the two channels. In this paper, we present a general physical model which explicitly accounts for physical effects such as channel coupling and drain induced conductance enhancement (DICE). The model is a major extension of the single-gate SOI MOSFET model to the double-gate case.\",\"PeriodicalId\":344728,\"journal\":{\"name\":\"1997 IEEE International SOI Conference Proceedings\",\"volume\":\"299 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-10-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1997 IEEE International SOI Conference Proceedings\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SOI.1997.634945\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1997 IEEE International SOI Conference Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOI.1997.634945","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A general physical model for short-channel double-gate SOI MOSFETS
Previous works on the modeling of short-channel double-gate devices in the above-threshold regime were based mainly on modifying the current expressions for bulk devices. These models would probably be of limited utility because they do not account for the central physical characteristic of the double-gate devices, namely the coupling of the two channels. In this paper, we present a general physical model which explicitly accounts for physical effects such as channel coupling and drain induced conductance enhancement (DICE). The model is a major extension of the single-gate SOI MOSFET model to the double-gate case.