结合传输线测量结构研究薄膜电阻式传感器的制作

Proceedings of the 2015 International Conference on Microelectronic Test Structures Pub Date : 2015-03-23 DOI:10.1109/ICMTS.2015.7106136

A. Tabašnikov, A. Walton, S. Smith

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引用次数: 1

摘要

本文报道了在图画化溅射氮化钽(TaN)上制备蒸发铂(Pt)薄膜结构时产生的电阻特征的测试结构的设计和应用。这两层的结合被用来制造一个集成的电阻式传感器结构。在测试结构设计中考虑了两个电阻特性:首先是两个金属层之间的接触电阻，其次是由于台阶覆盖效应在上层金属层引入的额外电阻。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Combined transmission line measurement structures to study thin film resistive sensor fabrication

This paper reports the design and application of test structures for extracting the resistance of features formed when fabricating evaporated platinum (Pt) thin film structures on patterned, sputtered tantalum nitride (TaN). The combination of these two layers is used to produce an integrated resistive sensor structure. Two resistive features were considered during the test structure design: firstly the contact resistance between the two metal layers and secondly, the additional resistance introduced in the upper metal layer due to step coverage effects.

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Proceedings of the 2015 International Conference on Microelectronic Test Structures

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