{"title":"MOS反转层经典表面势模型的量子力学修正","authors":"T. Kevkić, D. Petković","doi":"10.1109/MIEL.2010.5490519","DOIUrl":null,"url":null,"abstract":"In this paper, an analyse of variational wave function approach corrections of classical surface potential model of MOS inversion layer is presented. These solutions are based on smoothing functions and parameters. In this way an explicit surface potential versus gate voltage relations in the case of strong inversion in semiconductor is derived. Results of these models are compared with results obtained by the numerical solver of coupled Poisson-Schrodinger equations.","PeriodicalId":271286,"journal":{"name":"2010 27th International Conference on Microelectronics Proceedings","volume":"225 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"A quantum mechanical correction of classical surface potential model of MOS inversion layer\",\"authors\":\"T. Kevkić, D. Petković\",\"doi\":\"10.1109/MIEL.2010.5490519\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, an analyse of variational wave function approach corrections of classical surface potential model of MOS inversion layer is presented. These solutions are based on smoothing functions and parameters. In this way an explicit surface potential versus gate voltage relations in the case of strong inversion in semiconductor is derived. Results of these models are compared with results obtained by the numerical solver of coupled Poisson-Schrodinger equations.\",\"PeriodicalId\":271286,\"journal\":{\"name\":\"2010 27th International Conference on Microelectronics Proceedings\",\"volume\":\"225 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-05-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 27th International Conference on Microelectronics Proceedings\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MIEL.2010.5490519\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 27th International Conference on Microelectronics Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MIEL.2010.5490519","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A quantum mechanical correction of classical surface potential model of MOS inversion layer
In this paper, an analyse of variational wave function approach corrections of classical surface potential model of MOS inversion layer is presented. These solutions are based on smoothing functions and parameters. In this way an explicit surface potential versus gate voltage relations in the case of strong inversion in semiconductor is derived. Results of these models are compared with results obtained by the numerical solver of coupled Poisson-Schrodinger equations.