高电子迁移率晶体管紧凑建模的类mos方法

A. Vaysset, S. Martinie, F. Triozon, O. Rozeau, M. Jaud, R. Escoffier, T. Poiroux
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引用次数: 0

摘要

具有Al- GaN/GaN栅极堆栈的高电子迁移率晶体管(HEMT)是高速和高功率应用的有前途的候选者。最近的HEMT紧凑建模工作提出了基于阈值的[1]和基于表面电位的模型[2]。在后一种方法中,从二维电子气体(2DEG)的量子表达式计算反转电荷。在这里,我们研究了用类似mosfet的方法来模拟hemt的可能性,在这种方法中,量子约束作为有效的带隙加宽包含在表面势方程中。我们证明了这种类似mosfet的方法可以在整个极化范围内更准确地描述,特别是在中等反转区域。通过Poisson-Schrödinger数值模拟验证了该分析模型的正确性。此外,为了解决HEMT器件的具体特点,还提出了场极板模型。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
MOS-like approach for compact modeling of High-Electron-Mobility Transistor
High-Electron-Mobility Transistor (HEMT) with Al- GaN/GaN gate stack is a promising candidate for high-speed and high-power applications. Recent HEMT compact modeling works have proposed threshold-based [1] and surface-potential-based models [2]. In the latter approach, inversion charge is calculated from the quantum expression of a 2-dimensional electron gas (2DEG). Here, we investigate the possibility to model HEMTs with a MOSFET-like approach whereby quantum confinement is included as an effective bandgap widening in the surface potential equation. We evidence that such a MOSFET-like approach leads to a more accurate description over the whole polarization range, especially in the moderate inversion regime. This analytical model is validated by Poisson-Schrödinger numerical simulations. Furthermore, to address a specific feature of HEMT devices, a field plate model is also presented.
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