{"title":"缺陷捕获率对缺陷产出相关性和一般缺陷控制策略的影响","authors":"T. Tochtrop","doi":"10.1109/ASMC.2003.1194461","DOIUrl":null,"url":null,"abstract":"The influence of defect capture rate on defect line control and defect-yield-correlations is discussed. Practical examples reveal, that even for \"biggest killing defects\" capture rates are far below 100%. An overview about associated defect line control problems is given. A simple model, taking recipe parameters such like gain and threshold into account is discussed to describe one origin. Three examples are given which prove the strong influence of capture rate variations on practical aspects of defectivity. This realization enforces to revise defect line control strategies and defect-yield-correlation models.","PeriodicalId":178755,"journal":{"name":"Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI","volume":"148 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-04-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Influence of defect capture rate on defect-yield-correlations and generally defect control strategies\",\"authors\":\"T. Tochtrop\",\"doi\":\"10.1109/ASMC.2003.1194461\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The influence of defect capture rate on defect line control and defect-yield-correlations is discussed. Practical examples reveal, that even for \\\"biggest killing defects\\\" capture rates are far below 100%. An overview about associated defect line control problems is given. A simple model, taking recipe parameters such like gain and threshold into account is discussed to describe one origin. Three examples are given which prove the strong influence of capture rate variations on practical aspects of defectivity. This realization enforces to revise defect line control strategies and defect-yield-correlation models.\",\"PeriodicalId\":178755,\"journal\":{\"name\":\"Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI\",\"volume\":\"148 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2003-04-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.2003.1194461\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.2003.1194461","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Influence of defect capture rate on defect-yield-correlations and generally defect control strategies
The influence of defect capture rate on defect line control and defect-yield-correlations is discussed. Practical examples reveal, that even for "biggest killing defects" capture rates are far below 100%. An overview about associated defect line control problems is given. A simple model, taking recipe parameters such like gain and threshold into account is discussed to describe one origin. Three examples are given which prove the strong influence of capture rate variations on practical aspects of defectivity. This realization enforces to revise defect line control strategies and defect-yield-correlation models.
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