在非晶钽铝衬底上形成超织构铝提高电迁移寿命

Proceedings of 1994 IEEE International Reliability Physics Symposium Pub Date : 1994-04-11 DOI:10.1109/RELPHY.1994.307839

H. Toyoda, T. Kawanoue, M. Hasunuma, H. Kaneko, M. Miyauchi

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引用次数: 14

摘要

提出了一种利用非晶钽铝衬底制备超织构铝薄膜的新技术。铝膜的(111)摇摆曲线的半最大值全宽度(FWHM)小于1度。已经澄清了Al互连的电迁移(EM)寿命/spl tau/与FWHM值/spl ω /之间的经验关系描述为/spl tausup /spl prop/spl omegasup -2/。这一结果证实了超纹理是一种很有前途的方法，可以承受未来ulsi所需的更高电流密度

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Improvement in the electromigration lifetime using hyper-textured aluminum formed on amorphous tantalum-aluminum underlayer

A new fabrication technique for hyper-textured aluminum (Al) films has been developed by using an amorphous tantalum-aluminum (Ta-Al) underlayer. The full width at half maximum (FWHM) value of the (111) rocking curve for Al film has been attained to be less than 1 degree. It has been clarified that the empirical relation between the electromigration (EM) lifetime of an Al interconnection /spl tau/ and the FWHM value /spl omega/ is described as /spl tausup /spl prop/spl omegasup -2/. This result has confirmed that a hyper-texture is a promising approach to withstand higher current densities required in future ULSIs.<>

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Proceedings of 1994 IEEE International Reliability Physics Symposium

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