在存在PVTA变化的情况下,基于实例的SER分析

Bahareh J. Farahani, S. Safari
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引用次数: 4

摘要

随着半导体技术进入纳米级,单事件瞬态(SET)成为硅芯片面临的主要挑战之一。在工艺、电压、温度和晶体管老化(PVTA)变化的情况下,对软误差的敏感性甚至变得更加严重。在本文中,我们建立模型并分析了PVTA对VLSI芯片对SET敏感性的影响。我们表明,较高的PVTA导致硅的临界电荷显著降低(即更高的毛刺产生),同时电掩蔽(防止毛刺传播)得到改善。此外,我们提出了一种基于实例的整体系统方法来计算考虑PVTA变化的组合的软错误率(SER)。对各种ITC’99基准电路的仿真结果表明,忽略PVTA信息导致估计SER的平均误差为76%。此外,根据结果,由于晶体管老化,SER在电路寿命的头几年平均增加了70%,然后几乎饱和。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
An instance-based SER analysis in the presence of PVTA variations
As semiconductor technology has entered into the nanoscale regime, Single Event Transient (SET) became one of the major challenging issues for silicon chips. Susceptibility to soft error is even becoming more severe in the presence of Process, Voltage, Temperature, and transistor Aging (PVTA) variations. In this paper, we model and analyze the impacts of PVTA on the susceptibility of VLSI chips to SET. We show that higher PVTA results in significant reduction of critical charge (i.e, higher glitch generation) of silicons while electrical masking (preventing glitch propagation) is improved. In addition, we propose a holistic instance-based systematic methodology to calculate the Soft Error Rate (SER) of combinationals considering PVTA variations. The simulation results for various ITC'99 benchmark circuits show that disregarding PVTA information results in 76% error in the estimated SER on average. Moreover, according to the results, SER increases by 70% on average in the first years of circuit lifetime due to transistor aging and then it is almost saturated.
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