循环工作中DMOS晶体管金属化失效预警指标的提出

M. Ritter, M. Pfost
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引用次数: 7

摘要

在集成智能电源技术中,DMOS晶体管经常受到循环功耗和大量自热的影响。这会导致重复的热机械应力,导致片上金属化的疲劳并限制使用寿命。因此,大多数设计使用大型器件来降低峰值温度,从而减少应力,以避免过早失效。然而,如果系统在不久的将来预计会发生故障时恢复到更安全的操作条件和更低的应力,则可以接受明显更小的DMOS晶体管。因此,需要合适的预警传感器。本文提出了一种嵌入在DMOS源极和漏极之间的浮动金属导线,用于检测即将发生的金属化故障。将介绍和讨论几种变体的测量结果,调查其作为早期预警指标的适用性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A proposal for early warning indicators to detect impending metallization failure of DMOS transistors in cyclic operation
DMOS transistors in integrated smart power technologies are often subject to cyclic power dissipation with substantial self-heating. This leads to repetitive thermo-mechanical stress, causing fatigue of the on-chip metallization and limiting the lifetime. Hence, most designs use large devices for lower peak temperatures and thus reduced stress to avoid premature failures. However, significantly smaller DMOS transistors are acceptable if the system reverts to a safer operating condition with lower stress when a failure is expected to occur in the near future. Hence, suitable early-warning sensors are required. This paper proposes a floating metal meander embedded between DMOS source and drain to detect an impending metallization failure. Measurement results of several variants will be presented and discussed, investigating their suitability as early warning indicators.
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