高速0201实现的处理策略

P. Houston, J. Bentley, B. Lewis, B.A. Smith, D. Baldwin
{"title":"高速0201实现的处理策略","authors":"P. Houston, J. Bentley, B. Lewis, B.A. Smith, D. Baldwin","doi":"10.1109/IEMT.2002.1032745","DOIUrl":null,"url":null,"abstract":"A lot of research has been done to determine the board design considerations for 0201 processing, but work also needs to be done to determine the process window. Initial data presented last year showed a number of significant factors in the printing, placement, and reflow processes. From that study, the individual process steps showed that certain design and manufacturing parameters can have a huge effect upon total process defects. Presented in this paper is the data from those studies as well as the data gathered after a large evaluation run in which many components were processed. Studied process parameters were broken out by individual process steps initially, and then studied over the entire process. Some of the process parameters that were examined were stencil manufacturing method, print force, print speed, and stencil wipe frequency for the printing process and reflow atmosphere, profile shape, and ramp rate for the reflow process. From these studies, a reliable process window was obtained for a high speed 0201 assembly process that was proven to provide a 17 DPM (defect per million) assembly yield.","PeriodicalId":340284,"journal":{"name":"27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Processing strategies for high speed 0201 implementation\",\"authors\":\"P. Houston, J. Bentley, B. Lewis, B.A. Smith, D. Baldwin\",\"doi\":\"10.1109/IEMT.2002.1032745\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A lot of research has been done to determine the board design considerations for 0201 processing, but work also needs to be done to determine the process window. Initial data presented last year showed a number of significant factors in the printing, placement, and reflow processes. From that study, the individual process steps showed that certain design and manufacturing parameters can have a huge effect upon total process defects. Presented in this paper is the data from those studies as well as the data gathered after a large evaluation run in which many components were processed. Studied process parameters were broken out by individual process steps initially, and then studied over the entire process. Some of the process parameters that were examined were stencil manufacturing method, print force, print speed, and stencil wipe frequency for the printing process and reflow atmosphere, profile shape, and ramp rate for the reflow process. From these studies, a reliable process window was obtained for a high speed 0201 assembly process that was proven to provide a 17 DPM (defect per million) assembly yield.\",\"PeriodicalId\":340284,\"journal\":{\"name\":\"27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium\",\"volume\":\"11 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-11-07\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEMT.2002.1032745\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"27th Annual IEEE/SEMI International Electronics Manufacturing Technology Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEMT.2002.1032745","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

摘要

已经做了大量的研究来确定0201加工的电路板设计考虑因素,但还需要做一些工作来确定工艺窗口。去年提供的初步数据显示,在打印、放置和回流过程中存在一些重要因素。从该研究中,单个工艺步骤表明,某些设计和制造参数可能对整个工艺缺陷产生巨大影响。本文所提供的是这些研究的数据,以及在处理了许多组成部分的大型评估运行后收集的数据。所研究的工艺参数首先按单个工艺步骤进行分解,然后对整个工艺进行研究。测试的一些工艺参数包括打印过程中的模板制造方法、打印力、打印速度和模板擦拭频率,以及回流过程中的回流气氛、轮廓形状和斜坡速率。从这些研究中,获得了高速0201装配工艺的可靠工艺窗口,该工艺已被证明可提供17 DPM(每百万缺陷)装配良率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Processing strategies for high speed 0201 implementation
A lot of research has been done to determine the board design considerations for 0201 processing, but work also needs to be done to determine the process window. Initial data presented last year showed a number of significant factors in the printing, placement, and reflow processes. From that study, the individual process steps showed that certain design and manufacturing parameters can have a huge effect upon total process defects. Presented in this paper is the data from those studies as well as the data gathered after a large evaluation run in which many components were processed. Studied process parameters were broken out by individual process steps initially, and then studied over the entire process. Some of the process parameters that were examined were stencil manufacturing method, print force, print speed, and stencil wipe frequency for the printing process and reflow atmosphere, profile shape, and ramp rate for the reflow process. From these studies, a reliable process window was obtained for a high speed 0201 assembly process that was proven to provide a 17 DPM (defect per million) assembly yield.
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