项目前期设施和布局规划,以建立具有成本效益的晶圆冲压工艺

M. Wu, Y.G. Jin, S. Quek, S. Huang
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引用次数: 0

摘要

随着半导体组装中倒装芯片技术的出现,晶圆碰撞服务、设备制造商、材料和衬底供应商等基础设施受到了极大的关注。关于倒装芯片工艺的设施规划和设计很少有人提及。当技术发生快速变化时,从周期时间、产量、质量控制和可持续性方面对生产制造过程进行优化规划是非常重要的。本文探讨了在晶圆碰撞设置之前使用简化系统布局规划(SSLP)技术的设施布局设计。其他技术,如经验、克隆、战略或自下而上,即使不是不可能,也很难应用于具有新技术要求的过程。本研究通过分析宏观空间规划层面的四个基本要素:空间规划单元(spu)、亲和性、空间和约束,将“舞厅”设计与“细胞”设计进行比较。蜂窝布局安排比宴会厅设计更具成本效益,但以牺牲其灵活性为代价,以适应未来的变化和升级。在这种情况下,使用低增值空间比率来补偿灵活性的不足。为晶圆碰撞的子过程设计了不同的洁净室模块,以便将高级洁净室(ISO 5级)的面积最小化。最终的布局方案通过使用正-负-兴趣(PNI)和物料流分析(MFA)工具进一步评估。此外,还特别注意将新的和现有的过程结合起来。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Pre-project facility and layout planning for setting up cost effective wafer bumping processes
With the emergence of flip chip technologies in semiconductor assembly, a great deal of attention has been given to infrastructures such as wafer bumping services, equipment manufacturers, material and substrate suppliers. Little has been said about facility planning and design for flip chip processes. When rapid shifts in technology take place, optimum planning of facility layout is of great importance for productive manufacturing processes in term of cycle time, yield, quality control, and sustainability. This paper explores a facility layout design using Simplified Systematic Layout Planning (SSLP) techniques prior to the wafer bumping setup. Other techniques such as experiential, cloning, strategic or Bottom-up are difficult, if not impossible, to be applied in a process with new technological requirements. In this study, a "ball room" design is compared with "cellular" design by analyzing four basic elements: space planning units (SPUs), affinities, space, and constraints at the Macro-Space Plan level. The cellular layout arrangement is more cost effective than the ballroom design, however at the expense of its flexibility for future changes and upgrading. In this case, a low value-added space ratio is used to compensate the inflexibility. Differentiated cleanroom modules are designed for the sub-processes of wafer bumping so that the areas of high-grade cleanroom (ISO Class 5) are minimized. The final layout plan is further evaluated by using positive-negative-interesting (PNI) and material flow analysis (MFA) tools. In addition, special attention is paid to the integration of new and existing processes.
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