14nm逻辑技术中的随机电报噪声(RTN):大容量数据提取和分析

S. Dongaonkar, M. Giles, A. Kornfeld, B. Grossnickle, J. Yoon
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引用次数: 21

摘要

随着CMOS技术的不断扩展,人们对随机电报噪声(RTN)可能匹配或超过阈值电压(Vth)[1],[2]的随机过程变化提出了许多担忧。这些研究通常受到测量的小样本量的限制,依靠建模来投射到高西格玛。在这项工作中,我们使用改进的环形振荡器(RO)电路来测量单个晶体管(7500 NMOS和7500 PMOS)的RTN,用于英特尔当前的14纳米技术。我们分析了这些数据,仔细描述了噪声特征,并考虑了未显示RTN的设备。我们发现,在~3.7 sigma水平上,由RTN (ΔVthRTN)引起的Vth波动幅度<;25mV, ΔVthRTN与Vth随机变化不相关。从这些观察中,我们得出结论,RTN不是英特尔14nm节点电路设计的重大限制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Random telegraph noise (RTN) in 14nm logic technology: High volume data extraction and analysis
With continued scaling of CMOS technology, numerous concerns have been raised about random telegraph noise (RTN) possibly matching or exceeding the random process variation in threshold voltage (Vth)[1], [2]. These studies are usually limited by the small sample size of the measurements, relying on modeling for projecting to high sigma. In this work, we use a modified ring oscillator (RO) circuit to measure the RTN in individual transistors (7500 NMOS and 7500 PMOS), for Intel's current 14nm technology. We analyze this data, carefully characterizing the noise signatures and accounting for the devices not showing RTN. We show that magnitude of Vth fluctuation due to RTN (ΔVthRTN) at the ~3.7 sigma level is <; 25mV, and the ΔVthRTN is uncorrelated to Vth random variation. From these observations, we conclude that RTN is not a significant limitation for circuit design at Intel's 14nm node.
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