使用先进晶体管结构的细胞库技术

R. Aitken, S. Becker
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引用次数: 3

摘要

未来几代工艺的激进性能和功耗目标迫使人们重新思考CMOS晶体管的一些基本假设,并导致了应变硅和金属栅极等创新方法的出现。这些方法对标准单元、嵌入式存储器和其他库组件的设计具有启示意义。本文研究了这些新趋势,并展示了它们如何影响这些组件的设计,以及由此扩展的片上系统。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Cell library techniques using advanced transistor structures
Aggressive performance and power goals for coming process generations are forcing rethinking of some of the basic assumptions of CMOS transistors, and leading to innovative approaches such as strained silicon and metal gates. These methods have implications for the design of standard cells, embedded memories, and other library components. This paper examines these new trends and shows how they affect the design of these components, and by extension, the systems-on-chip built from them.
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