{"title":"具有InGaAs源极和InP漏极的非对称InGaAs mosfet","authors":"Jiongjiong Mo, E. Lind, L. Wernersson","doi":"10.1109/ICIPRM.2014.6880553","DOIUrl":null,"url":null,"abstract":"Asymmetric In<sub>0.53</sub>Ga<sub>0.47</sub>As MOSFETs with different regrown contacts at source (In<sub>0.53</sub>Ga<sub>0.47</sub>As) and drain (InP) have been developed. By introducing a wider bandgap material, InP as drain electrode, higher self-gain g<sub>m</sub>/g<sub>d</sub> has been obtained with reduced output conductance g<sub>d</sub> and improved break-down voltage V<sub>bd</sub>. For L<sub>g</sub>=100nm, a high oscillation frequency f<sub>max</sub>=270GHz has been obtained using an InP drain.","PeriodicalId":181494,"journal":{"name":"26th International Conference on Indium Phosphide and Related Materials (IPRM)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Asymmetric InGaAs MOSFETs with InGaAs source and InP drain\",\"authors\":\"Jiongjiong Mo, E. Lind, L. Wernersson\",\"doi\":\"10.1109/ICIPRM.2014.6880553\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Asymmetric In<sub>0.53</sub>Ga<sub>0.47</sub>As MOSFETs with different regrown contacts at source (In<sub>0.53</sub>Ga<sub>0.47</sub>As) and drain (InP) have been developed. By introducing a wider bandgap material, InP as drain electrode, higher self-gain g<sub>m</sub>/g<sub>d</sub> has been obtained with reduced output conductance g<sub>d</sub> and improved break-down voltage V<sub>bd</sub>. For L<sub>g</sub>=100nm, a high oscillation frequency f<sub>max</sub>=270GHz has been obtained using an InP drain.\",\"PeriodicalId\":181494,\"journal\":{\"name\":\"26th International Conference on Indium Phosphide and Related Materials (IPRM)\",\"volume\":\"11 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-05-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"26th International Conference on Indium Phosphide and Related Materials (IPRM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.2014.6880553\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"26th International Conference on Indium Phosphide and Related Materials (IPRM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.2014.6880553","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Asymmetric InGaAs MOSFETs with InGaAs source and InP drain
Asymmetric In0.53Ga0.47As MOSFETs with different regrown contacts at source (In0.53Ga0.47As) and drain (InP) have been developed. By introducing a wider bandgap material, InP as drain electrode, higher self-gain gm/gd has been obtained with reduced output conductance gd and improved break-down voltage Vbd. For Lg=100nm, a high oscillation frequency fmax=270GHz has been obtained using an InP drain.