高na氮化镓衍射微透镜的制备

IEEE/LEOS International Conference on Optical MEMs Pub Date : 2002-11-07 DOI:10.1109/OMEMS.2002.1031446

Chii-Chang Chen, Ming-Hung Li, Chih-Yang Chang, G. Chi, Jenq-Yang Chang, W. Cheng, J. Yeh, C. Wu

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引用次数: 2

摘要

提出了采用灰度掩模和电感耦合等离子体刻蚀法制备高数值孔径GaN衍射微透镜的方法。(NA=0.85)微透镜是为高密度光学数据存储应用而设计的。讨论了用氮化镓作为衍射微透镜材料的优点。

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Fabrication of high-NA GaN diffractive microlenses

We present the fabrication of the high-numerical-aperture GaN diffractive microlenses by gray-level mask and inductively coupled plasma etching. (NA=0.85) The microlenses were designed for the application of high-density optical data storage. The advantage of using GaN as the material of the diffractive microlenses is discussed.

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IEEE/LEOS International Conference on Optical MEMs

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