利用TCAD设计CMOS工艺,使IC功耗最小化

A. von Schwerin, D. Schumann, J. Berthold
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引用次数: 0

摘要

以CMOS低压工艺设计为例,介绍了CAD技术在工业上的应用。TCAD工具用于评估G/sub P/,功率效率(即电池寿命)的增益,通过降低电源电压(V/sub dd/),适应阈值电压(V/sub th/)和栅极长度缩放来实现恒定性能。根据集成电路的特性,研究了漏损与有功功率之间的权衡关系。对于具有32kb片上SRAM的16位微处理器,在V/sub / of /spl plusmn/0.3V和V/sub / dd/ 1.3V时,最大G/sub / P/约为7。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
CMOS process design for minimization of IC power consumption using TCAD
CMOS low-voltage process design is presented as an example of industrial application of technology CAD. TCAD tools are used to evaluate G/sub P/, the gain in power efficiency (i.e. battery lifetime) which is achievable by reduction of supply voltage (V/sub dd/) with adaptation of threshold voltage (V/sub th/) and gate length scaling for constant performance. The trade-off between leakage and active power depending on the IC properties is studied. Maximum G/sub P/ found for a 16 bit microprocessor with 32 kB on chip SRAM is about 7 for V/sub th/ of /spl plusmn/0.3V and V/sub dd/ of 1.3V.
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