作为晶圆碰撞结构的焊料-钝化连接的评估:1 .绝缘性能

I. R. Harvey, M. Larsen, D. Turner, I. Doyle, J. Somers, J. Ortowski
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引用次数: 0

摘要

本文描述了在所谓的“宽通孔”设计中直接机械连接焊料凸点到基本IC钝化的概念-这是一种被Bourns拒绝使用的低成本设计选项。通常在ASIC或其他有源器件上使用,该架构依赖于氧化物/氮化钝化堆栈来完成IC路由金属化的保形覆盖,并假设没有针孔。我们已经创建了一个测试芯片来评估BHT测试下这些假设的有效性,以及比较热机械性能和诱导寄生效应。在本文中,我们描述了BHT和失效分析结果,表明钝化过程需要优化才能使该体系结构工作。这一结果对“过栅栏”设计产生了影响,在这种设计中,凸点供应商对IC制造商的钝化质量做出了假设,以及对于外围线键合应用来说足够好的钝化堆栈如何可能需要重新考虑区域阵列凸点。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Evaluation of solder-to-passivation attachment as a wafer bumping architecture: I. Insulating properties
This paper describes the concept of direct mechanical attachment of a solder bump to the base IC passivation, in what has been called "wide via" design - a low-cost design option rejected for use by Bourns. In general use over an ASIC or other active device, this architecture relies upon the oxide/nitride passivation stack for complete conformal coverage of IC routing metalization, and assumes an absence of pinholes. We have created a test chip to evaluate the validity of these assumptions under BHT testing, as well as to enable comparative thermomechanical performance and induced parasitic effects. In this paper, we describe the BHT and failure analysis results indicating that passivation processes need to be optimized in order for this architecture to work. This result has implications in "over-the-fence" design in which a bump supplier makes assumptions regarding the quality of passivation from an IC manufacturer, and how passivation stacks which were good enough for peripheral wire bonding applications may need to be re-thought for area-array bumping.
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