用蒙特卡罗暂态技术模拟纳米SOI器件的高频响应

J. M´endez-V, Ieee D. Vasileska Fellow, Ieee E. A. Guti´errez Fellow Member, Ieee K. Raleva Senior Member
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引用次数: 0

摘要

SOI技术为模拟和射频应用提供了几个固有的优势。事实上,这些技术可以在给定的工作频率下降低功耗。由于这些特性,纳米SOI器件被认为是实现5G通信技术的最佳选择之一。因此,需要对纳米mosfet的高频性能进行表征。为此,实现了集成蒙特卡罗器件模拟器,以表征45纳米纳米技术节点部分耗尽SOI器件的高频性能。Y和s参数的仿真结果与实验数据一致,验证了理论模型的正确性,表明该模拟器能够预测不同技术节点的各种SOI器件的高频工作。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Modeling High Frequency Response of Nanometer SOI Devices Using Monte Carlo Transient Technique
The SOI technologies present several intrinsic advantages for analog and RF applications. Indeed, these technologies allow the reduction of the power consumption at a given operating frequency. Because of these properties, nanometer SOI devices are considered as one of the best options for the implementation of 5G communication technology. Hence, characterization of the high frequency performance of nanometer MOSFETs is needed. Ensemble Monte Carlo device simulator is implemented for this purpose to characterize the high frequency performance of 45 nm nanometer technology node partially-depleted SOI devices. Simulation results for the Y- and S-parameters agree with experimental data, which validates our theoretical model, and suggests that our simulator is able to predict high-frequency operation of a variety of SOI devices from different technology nodes.
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