半导体控制整流器中回跳的纳秒瞬态热反射成像

K. Maize, D. Kendig, A. Shakouri, V. Vashchenko
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引用次数: 7

摘要

本文首次应用瞬态热反射成像方法,通过自加热引起的表面温度变化来揭示ESD保护器件中的电流分布。实验校准了一个多指,80平方微米的100V NLDMOS-SCR器件在不同电流水平(1.15-1.47A)和不同时间(100纳秒至1毫秒)下的snapback操作模式下的温度图像。这种新颖的应用方法展示了一种实用而直接的方法来表征ESD结构中的非均匀温度和电流分布,揭示了单个手指非同时触发对多指可控硅器件的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Nanosecond transient thermoreflectance imaging of snapback in semiconductor controlled rectifiers
Transient thermoreflectance imaging method has been applied for the first time to reveal current distribution in ESD protection devices through the surface temperature change due to self heating. Experimentally calibrated temperature images are obtained of a multiple finger, 80 square micron 100V NLDMOS-SCR device in snapback operation regimes for different current levels (1.15–1.47A) and at different times ranging between 100 nanoseconds to one millisecond after the ESD pulse. The novel applied methodology demonstrates a practical and straightforward way to characterize non-uniform temperature and current distribution in ESD structures, revealing effects of non-simultaneous triggering of individual fingers on the multiple finger SCR device.
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