回流焊中的实时应力监测:Si(111)中的Cu薄膜

Li Song, An Bing, Zhang Tong-jun, Wu Yi-ping, Dai Wei
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引用次数: 0

摘要

基片曲率法是一种多用途的光学应力测量方法,具有实时、快速、无损、操作方便等优点。研制了一种基于单片机的薄膜应力测量仪,对射频磁控溅射制备的Ag/Cu多层薄膜和Cu薄膜上回流焊的Si(111)薄膜应力进行了检测。研究了其应力-温度行为。温度不同,银/铜多层薄膜中的应力也不同。由于过量的金属间化合物的产生,导致Cu薄膜在Si(111)中回流焊时产生不同的应力。结果表明,界面反应动力学对润湿动力学有明显的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Real time stress monitoring in reflow solder: Cu thin films in Si(111)
Substrate curvature method (SCM) is a versatile optical stress measuring method which owns a lot of merits: realtime, rapid, nondestructive, easily operating. A film stress measuring apparatus by SCM was developed, and stresses in Ag/Cu multilayer thin films and reflow solder on Cu thin films in Si(111) prepared by RF magnetron sputtering were detected. The stress-temperature behavior was studied. The stresses in Ag/Cu multilayer thin films were different due to different temperature. The stresses in reflow solder on Cu thin films in Si(111) were different due to the generation of excessive amounts of intermetallic compound. The results identify that the interfacial reaction kinetics has effect on wetting dynamics in evidence.
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