高铜低温铜键的显微组织分析及抗拉强度

J. Ong, K. Shie, Chih Chen
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引用次数: 1

摘要

研究表明,通过调整铜接头的显微组织,可以提高铜接头的结合强度。本研究中使用的铜衬垫是表面比大于95%的纳米孪晶铜衬垫。结果表明,在较低的温度、较低的压力和较短的粘接时间内即可获得较好的粘接强度。一旦键合时间或压力增加,就会引发再结晶和晶粒长大。通过调整键合时间或键合温度,可以控制铜焊盘的微观结构,从而通过调整铜焊盘的微观结构来提高键合强度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Microstructure analysis and tensile strength of low temperature Cu bonds using highly-<111> Cu
This investigation shows bonding strength improvement by adjusting the microstructures in the Cu joints. The Cu pad used in this investigation is nanotwinned Cu pad with surface ratio more than 95% <111> preferred oriented. Result showed that bonding strength can be obtained in low temperature and pressure applied and short time during bonding process. Once the bonding time or pressure increases, recrystallization and grain growth triggered. By adjusting bonding time or bonding temperature, the microstructure in Cu pad can be controlled thus the bonding strength can be improved by adjusting microstructures in the Cu pads.
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