电子束光刻工艺在学术环境下的发展

2004 IEEE Workshop on Microelectronics and Electron Devices Pub Date : 2004-09-27 DOI:10.1109/WMED.2004.1297370

G.S. Gatlin, C. Eskridge, J. Brinkerhoff, J. Fife, J. Jessing

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引用次数: 1

摘要

本文比较了光刻和电子束光刻的工艺。此外，我们讨论了在大学实验室中实施EBL的程序，特别是博伊西州立大学(BSU)爱达荷微加工实验室(IML)。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Process development of electron beam lithography in an academic environment

This paper compares the processes of photolithography and electron beam lithography (EBL). In addition, we discuss the procedure used to implement EBL in a university laboratory, specifically Boise State University's (BSU) Idaho Microfabrication Laboratory (IML).

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来源期刊

2004 IEEE Workshop on Microelectronics and Electron Devices

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