{"title":"用逆行通道剖面观察到的器件驱动电流退化","authors":"S. Venkatesan, J. Lutze, C. Lage, W. Taylor","doi":"10.1109/IEDM.1995.499228","DOIUrl":null,"url":null,"abstract":"Super steep retrograde channel profiles have been widely known to produce improved short channel characteristics in sub-0.35 /spl mu/m CMOS technologies. In this paper, an attempt is made to leverage this improved short channel behaviour and thereby improve transistor performance (as measured by the current drive). Whereas significant improvements in short channel effects measured by DIBL and /spl Delta/Vt/sub sat/ are obtained with retrograde channels, it is observed that for a fixed gate length and equal threshold voltage, transistors with retrograde channel profiles typically exhibit lower drive currents than equivalent transistors fabricated with conventional doping profiles. Potential trade offs in device design resulting from this observation are discussed.","PeriodicalId":137564,"journal":{"name":"Proceedings of International Electron Devices Meeting","volume":"70 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-12-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"26","resultStr":"{\"title\":\"Device drive current degradation observed with retrograde channel profiles\",\"authors\":\"S. Venkatesan, J. Lutze, C. Lage, W. Taylor\",\"doi\":\"10.1109/IEDM.1995.499228\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Super steep retrograde channel profiles have been widely known to produce improved short channel characteristics in sub-0.35 /spl mu/m CMOS technologies. In this paper, an attempt is made to leverage this improved short channel behaviour and thereby improve transistor performance (as measured by the current drive). Whereas significant improvements in short channel effects measured by DIBL and /spl Delta/Vt/sub sat/ are obtained with retrograde channels, it is observed that for a fixed gate length and equal threshold voltage, transistors with retrograde channel profiles typically exhibit lower drive currents than equivalent transistors fabricated with conventional doping profiles. Potential trade offs in device design resulting from this observation are discussed.\",\"PeriodicalId\":137564,\"journal\":{\"name\":\"Proceedings of International Electron Devices Meeting\",\"volume\":\"70 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-12-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"26\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of International Electron Devices Meeting\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.1995.499228\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.1995.499228","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Device drive current degradation observed with retrograde channel profiles
Super steep retrograde channel profiles have been widely known to produce improved short channel characteristics in sub-0.35 /spl mu/m CMOS technologies. In this paper, an attempt is made to leverage this improved short channel behaviour and thereby improve transistor performance (as measured by the current drive). Whereas significant improvements in short channel effects measured by DIBL and /spl Delta/Vt/sub sat/ are obtained with retrograde channels, it is observed that for a fixed gate length and equal threshold voltage, transistors with retrograde channel profiles typically exhibit lower drive currents than equivalent transistors fabricated with conventional doping profiles. Potential trade offs in device design resulting from this observation are discussed.