2.5D和3d堆叠DRAM处理器之间的可靠性性能权衡

S. M. Hassan, William J. Song, S. Mukhopadhyay, S. Yalamanchili
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引用次数: 4

摘要

三维DRAM堆叠已成为缩放系统密度和提高性能的一种手段。处理器接口的两种设计选择是- i)通过硅中间层(2.5D)连接到DRAM堆栈的单独核心芯片,以及ii)堆叠在核心芯片顶部的DRAM芯片(3D)。这些备选方案具有不同的性能、功率和可靠性行为。具体来说,3D设计实现了更高的性能,但在更高的温度下工作,因此寿命较短。另一方面,2.5D设计在核心芯片和DRAM堆栈之间提供较低的带宽,但由于较少的热致退化,其寿命明显更长。本文探讨了3D和2.5D堆叠存储系统的可靠性和性能之间的权衡。我们的研究结果表明,一般来说,3D堆叠系统的低电压和低频率操作可以实现平衡的可靠性性能权衡。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reliability-performance tradeoffs between 2.5D and 3D-stacked DRAM processors
Three-dimensional DRAM stacking has emerged as a vehicle for scaling system densities and performance improvement. The two design choices for interfacing to processors are - i) a separate core die connected to the DRAM stack via a silicon interposer (2.5D), and ii) DRAM die stacked on top of the core die (3D). These alternatives have different performance, power, and reliability behaviors. Specifically, 3D designs realize higher performance but operate at higher temperatures and thus exhibit lower lifetime. On the other hand, 2.5D designs provide lower bandwidth between the core die and the DRAM stack, but exhibit significantly longer lifetime due to less thermally-induced degradation. This paper explores this tradeoff between reliability and performance of 3D and 2.5D stacked memory systems. Our results indicate that, in general, lower voltage and frequency operations with 3D stacked systems may achieve balanced reliability-performance tradeoff.
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